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Low Temperature Deposition of Diamond Thin Films Using Electron Cyclotron Resonance Plasmas

Published online by Cambridge University Press:  21 February 2011

Donald R. Gilbert  and
Rajiv K. Singh
Donald R. Gilbert
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
Rajiv K. Singh
Affiliation:
University of Florida, Department of Materials Science and Engineering, Gainesville, FL 32611
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Abstract

We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550 - 750 °C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 329
Copyright
Copyright © Materials Research Society 1995

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References

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