Published online by Cambridge University Press: 21 February 2011
We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550 - 750 °C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.