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Low Temperature Ceramic Coatings for Environmental Protection of Integrated Circuits
Published online by Cambridge University Press: 25 February 2011
Abstract
A novel concept for improved environmental protection of integrated circuits uses thin, in-situ formed ceramic layers on the circuit surface. Metastable ceramic precursors, hydrogen silsesquioxane and silacyclobutane, convert to pure silica and amorphous silicon carbide dielectric films respectively upon processing at temperatures from 175 to 250ºC. These twolayer ceramic films were shown to protect silicon CMOS circuits from industry-recognized autoclave and HAST exposure environments for more than 400 hours whereas unprotected circuits always failed within 200 hours.
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- Copyright © Materials Research Society 1991
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