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Low Substrate Temperature Deposition of Crystalline SiC using HWCVD

Published online by Cambridge University Press:  01 February 2011

S. Klein ,
R. Carius ,
L. Houben  and
F. Finger
S. Klein
Affiliation:
Institut für Photovoltaik, Forschungszentrum Jülich, 52425 Jülich, Germany Tel: +49-2461-61-2813, Fax:+49-2461-61-3735, email: [email protected]
R. Carius
Affiliation:
Institut für Photovoltaik, Forschungszentrum Jülich, 52425 Jülich, Germany Tel: +49-2461-61-2813, Fax:+49-2461-61-3735, email: [email protected]
L. Houben
Affiliation:
Institut für Festkörperforschung, Forschungszentrum Jülich, 52425 Jülich, Germany
F. Finger
Affiliation:
Institut für Photovoltaik, Forschungszentrum Jülich, 52425 Jülich, Germany Tel: +49-2461-61-2813, Fax:+49-2461-61-3735, email: [email protected]
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Abstract

Microcrystalline silicon carbide (μc-SiC) was prepared at substrate temperatures between 300°C and 450°C using Hot Wire Chemical Vapour Deposition (HWCVD). The SiC films were deposited from monomethylsilane (MMS) diluted in hydrogen on glass and crystalline silicon substrates. The influence of the hydrogen dilution on the deposition rate and the structural and the optoelectronic properties was investigated. Infrared and Raman spectroscopy and transmission electron microscopy (TEM) were applied to study the structural properties. Highly crystalline material with large columnar grains was obtained at high hydrogen dilutions. The optical absorption below the band gap is high and the dark conductivities are far above the values expected for intrinsic SiC. At lower hydrogen dilution, less crystalline or amorphous Si1-xCx is growing, showing broader IR- and Raman peaks, lower dark conductivity and higher absorption above the band gap energy. An extended nucleation zone with large structural disorder was observed even for highly crystalline material.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 862: Symposium A – Amorphous and Nanocrystalline Silicon Science and Technology–2005 , 2005 , A10.6
Copyright
Copyright © Materials Research Society 2005

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