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Low Resistive and Low Absorptive Nitride-Based Tunnel junctions

Published online by Cambridge University Press:  13 February 2015

Daichi Minamikawa
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Daiki Takasuka
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Masataka Ino
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Motoaki Iwaya
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Tetsuya Takeuchi
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Satoshi Kamiyama
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan.
Isamu Akasaki
Affiliation:
Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan. Graduate School of Engineering, Akasaki Research Center, Nagoya University, Nagoya 464-8601, Japan
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Abstract

We have investigated two approaches for an alternative hole injection with a tunnel junction targeting deep UV-LEDs. One was an AlGaN-based tunnel junction. We fabricated the AlGaN-based tunnel junctions with various AlN mole fractions (0~0.2) grown on conventional blue-LEDs by MOVPE. A 7.5 nm heavily Mg-doped GaN/15 nm heavily Si-doped Al0.2Ga0.8N tunnel junction showed a large voltage drop, 5.31 V at 20 mA, under reverse bias. The other was a GaInN-based tunnel junction. We prepared Ga0.6In0.4N tunnel junctions with various thicknesses and Si doping levels grown on the blue LEDs by MOVPE. A 2 nm heavily Mg-doped Ga0.6In0.4N/3 nm heavily Si-doped GaN tunnel junction showed only 0.12 V drop at 20mA under reverse bias. Since an absorption of the thin GaInN tunnel junction was estimated to be less than 10 %, such a tunnel junction with small bandgap and thin layer thickness is a practical approach to obtain a low resistive and low absorptive hole injection in the deep UV-LEDs.

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Articles
Copyright
Copyright © Materials Research Society 2015 

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References

REFERENCES

Esaki, L.: Phys. Rev. 109(1958) 603.CrossRefGoogle Scholar
Takamoto, T., Ikeda, E., Kurita, H., and Ohmori, M.: Appl. Phys. Lett. 70(1997) 381.CrossRefGoogle Scholar
Sugiura, H., Amano, C., Yamamoto, A., and Yamaguchi, M.: Jpn. J. Appl. Phys. 27 (1988) 269.CrossRefGoogle Scholar
Diagne, M., He, Y., Zhou, H., Makarona, E., Nurmikko, A. V., Han, J., Waldrip, K. E., Figiel, J. J., Takeuchi, T., and Krames, M.: Appl. Phys. Lett. 79 (2001) 3720.CrossRefGoogle Scholar
Mehta, M., Feezell, D., Buell, D. A., Jackson, A.W., Coldren, L. A., and Bowers, J. E.: IEEE J. Quantum Electron. 42(2006) 675.CrossRefGoogle Scholar
Jeon, S. R., Oh, C. S., Yang, J. W., Yang, G. M., and Yoo, B. S.: Appl. Phys. Lett. 80 (2002) 1933.CrossRefGoogle Scholar
Feezell, D., Buell, D. A., Lofgreen, D., Mehta, M, and Coldren, L. A.,: IEEE J. Quantum Electron. 42 (2006) 494.CrossRefGoogle Scholar
Krishnamoorth, S., Akyol, F., Sung Park, P. and Rajan, S.: Appl. Phys. Lett. 102, 113503 (2013).CrossRefGoogle Scholar
Minamikawa, D., Ino, M., Kawai, S., Takeuchi, T., Kamiyama, S., Iwaya, M., and Akasaki, I.: IWN2014 TuGP39.Google Scholar
Kurokawa, H., Kaga, M., Goda, T., Iwaya, M., Takeuchi, T., Kamiyama, S., Akasaki, I. and Amano, H.: Appl. Phys. Express 7 034104(2014).CrossRefGoogle Scholar
Watanabe, M., Nakajima, K., Kaga, M., Kuwano, Y., Minamikawa, D., Suzuki, T., Yamashita, K., Iwaya, M., Takeuchi, T., Kamiyama, S., and Akasaki, I.: Jpn. J. Appl. Phys. Lett., 53, 05FL06 (2014).CrossRefGoogle Scholar
Nakamura, S. : J. Appl. Phys. Vol. 30, No. 10A, (1001)pp. L1705L1707.Google Scholar
Kuwano, Y., Kaga, M., Morita, T., Yamashita, K., Yagi, K., Iwaya, M., Kamiyama, T., Takeuchi, S., and Akasaki, I.: Jpn. J. Appl. Phys. Lett. 52, 08JK12 (2013).CrossRefGoogle Scholar
Kaga, M., Morita, T., Kuwano, Y., Yamashita, K., Yagi, K., Iwaya, M., Takeuchi, T., Kamiyama, S., and Akasaki, I.: Jpn. J. Appl. Phys. Lett. 52, 08JH06 (2013).CrossRefGoogle Scholar
Minamikawa, D., Kuwano, Y., Kawai, S., Morita, T., Takeuchi, T., Iwaya, M., Kamiyama, S. and Akasaki, I.: ISPlasma 2014/IC-PLANTS 2014 06aP52.Google Scholar
Minamikawa, D., Kaga, M., Kuwano, Y., Morita, T., Takeuchi, T., Kamiyama, S., Iwaya, M. and Akasaki, I.: APWS2013 TB4–6.Google Scholar
Takeuchi, T., Amano, H. and Akasaki, I.: Jpn. J. Appl. Phys. 39 (2000) 413416.CrossRefGoogle Scholar