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Low K Mesoporous Silica Films Through Template-Based Processing

Published online by Cambridge University Press:  15 February 2011

P.J. Bruinsma ,
N.J. Hess ,
J.R. Bontha ,
J. Liu  and
S. Baskaran
P.J. Bruinsma
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, Richland, WA 99352
N.J. Hess
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, Richland, WA 99352
J.R. Bontha
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, Richland, WA 99352
J. Liu
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, Richland, WA 99352
S. Baskaran
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, Richland, WA 99352
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Abstract

Low dielectric-constant mesoporous silica films were prepared by condensation of a silicate network around surfactant micellar structures. Adherent, porous films 0.5–1.0 μm in thickness, and containing an ordered assemblage of ≈2 nm diameter pores were synthesized by spin-coating water/ethanol-based solutions containing a silica precursor and surfactant template. In this paper, film deposition conditions are described, and film thickness, porosity, refractive index and dielectric constant measured by ellipsometry are presented. Using a coating solution containing tetraethyl orthosilicate (TEOS) and a cationic cetyltrimethylammonium chloride (CTAC) surfactant template, the film porosity and dielectric properties were controlled over a wide range by adjusting the CTAC/TEOS molar ratio. With the CTAC/TEOS ratio between 0.1 and 0.15, the pores were highly ordered in hexagonal arrays after heat treatment at 550 °C. With a CTAC/TEOS ratio of 0.21, films with a pore volume of ≈64% (≈36 vol% silica) could be synthesized. The measured index of refraction for these highly porous films at 500 nm wavelength was 1.16, indicating that these films are potentially useful as low K interlayer dielectrics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 443: Symposium H – Low-Dielectric Constant Materials II , 1996 , 105
Copyright
Copyright © Materials Research Society 1997

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