No CrossRef data available.
Article contents
Low Contact Resistivity Mn/Au/Ti/Pd/Au P-Ohmic Contacts for HBTs
Published online by Cambridge University Press: 22 February 2011
Abstract
Obtaining good p-ohmics to the base layers of AlGaAs/GaAs HBTs have been difficult due to metal spiking and instability of the contacts to subsequent processing temperatures. To avoid spiking, non-alloyed contacts have been traditionally used. In this paper, we present a stable, non-spiking, low contact resistivity alloyed p-ohmic contact to HBT structures.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1993
References
REFERENCES
1.
Brooks, R.C.
et al. ,“Low-Resistance Ohmic Contacts to P-type GaAs Using Zn/Pd/Au Metallization”, IEEE Electron Device Letters, 6(10), pp 525–527, 1985.Google Scholar
2.
Hirano, M. and Yanagawa, F., “Low- Resistance Ohmic Contacts to pGaAs”, Jap. J. App. Phys.
25 (8), pp 1268–1269, 1986.Google Scholar
3.
Chevaillier, C. D.
et al. , “Comprehensive Study of AuMn p-type Ohmic Contact for GaAs/GaAlAs Heterojunction Bipolar Transistors”, J. Appl. Phys., 59(11), pp 3783–3786, 1986
Google Scholar