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Liquid Delivery of Low Vapor Pressure MOCVD Precursors

Published online by Cambridge University Press:  15 February 2011

R. A. Gardiner ,
P. C. Van buskirk  and
P. S. Kirlin
R. A. Gardiner
Affiliation:
Advanced Technology Materials Inc., 7 Commerce Dr., Danbury, CT 06810
P. C. Van buskirk
Affiliation:
Advanced Technology Materials Inc., 7 Commerce Dr., Danbury, CT 06810
P. S. Kirlin
Affiliation:
Advanced Technology Materials Inc., 7 Commerce Dr., Danbury, CT 06810
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Abstract

A significant limitation in MOCVD processing of advanced materials is the ability to deliver low volatility precursors, in a repeatable fashion, to the deposition reactor. Apparatus for delivering low volatility precursors in gaseous form, wherein a precursor source liquid is flash vaporized at elevated temperature has been developed. Stable, reproducible delivery of liquid precursors for TiN and Ta2O5 has been demonstrated. For multicomponent ceramic material systems simultaneous delivery of multiple cation species via a single source liquid has been achieved. The effect of flash vaporization on precursors for PZT was investigated. Pb, Zr and Ti precursors were dissolved in an organic medium with a defined cation ratio. The source solution was vaporized, the precursors transported as vapor then collected and analyzed by 1H and 13C nmr. No decomposition of the precursors was observed post vaporization and source solution stoichiometry was maintained in the collected material. The use of this flash vaporization technique has already been particularly successful for MOCVD of BaTiO3, MgAl2O4, YBa2Cu3O7−x, YSZ, LaSrCoO3 and Cu metal.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 335: Symposium Y – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics , 1993 , 221
Copyright
Copyright © Materials Research Society 1994

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