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Lattice-Gas Models of Electrochemical Adsorption: Static and Dynamic Aspects

Published online by Cambridge University Press:  10 February 2011

Per Arne Rikvold
Affiliation:
Center for Materials Research and Technology, Supercomputer Computations Research Institute, and Department of Physics, Florida State University, Tallahassee, FL 32306 Department of Fundamental Sciences, College of Integrated Human Studies, Kyoto University, Kyoto 606, Japan
Andrzej Wieckowski
Affiliation:
Department of Chemistry and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, IL 61801
Raphael A. Ramos
Affiliation:
Center for Materials Research and Technology, Supercomputer Computations Research Institute, and Department of Physics, Florida State University, Tallahassee, FL 32306 Department of Physics, University of Puerto Rico, Mayaguez, PR 00681
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Abstract

We discuss applications of statistical-mechanical lattice-gas models to electrochemical adsorption. Our strategy to describe specific systems includes microscopic model formulation, calculation of zero-temperature phase diagrams, numerical simulation of thermody-namic and structural quantities at nonzero temperatures, and estimation of effective, lateral interactions. We report applications to adsorption on single-crystal electrodes, presenting simulated and experimental coverages and voltammetric currents for urea on Pt(100) and the underpotential deposition of Cu on Au(111) in sulfuric acid. We also discuss an extension of the method to study time-dependent phenomena far from equilibrium.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Gamboa-Aldeco, M., Mrozek, P., Rhee, C.K., Wieckowski, A., Rikvold, P.A., and Wang, Q., Surf. Sci. Lett. 297, L135 (1993).Google Scholar
2. Rikvold, P.A., Gamboa-Aldeco, M., Zhang, J., Han, M., Wang, Q., Richards, H.L., and Wieckowski, A., Surf. Sci. 335, 389 (1995).Google Scholar
3. Rikvold, P.A., Zhang, J., Sung, Y.-E., and Wieckowski, A., Electrochim. Acta 41, 2175 (1996).Google Scholar
4. Zhang, J., Sung, Y.-E., Rikvold, P.A., and Wieckowski, A., J. Chem. Phys. 104, 5699 (1996).Google Scholar
5. Rikvold, P.A., Collins, J.B., Hansen, G.D., and Gunton, J.D., Surf. Sci. 203, 500 (1988).Google Scholar
6. Huckaby, D.A. and Blum, L., J. Electroanal. Chem. 315, 255 (1991).Google Scholar
7. Blum, L., Huckaby, D.A., and Legault, M., Electrochim. Acta 41, 2207 (1996).Google Scholar
8. Rubel, M., Rhee, C.K., Wiekowski, A., and Rikvold, P.A., J. Electroanal. Chem. 315, 301 (1991).Google Scholar
9. Schultze, J.W. and Dickertmann, D., Surf. Sci. 54, 489 (1976).Google Scholar
10. Zei, M., Qiao, G., Lempfuhl, G., and Kolb, D.M., Ber. Bunsen Ges. Phys. Chem. 91, 3494 (1987).Google Scholar
11. Zelenay, P. and Wieckowski, A., in In Situ Studies of Electrochemical Interfaces: A Prospectus, edited by Abruña, H.D. (VCH Publishers, New York, 1991).Google Scholar
12. Peremans, A. and Tadjeddine, A., Phys. Rev. Lett. 73, 3010 (1994).Google Scholar
13. Climent, V., Rodes, A., Orts, J.M., Feliu, J.M., Pérez, J.M, and Aldaz, A., Langmuir, in press.Google Scholar
14. Toney, M.F., Howard, J.N., Richer, J., Borges, G.L., Gordon, J.G. II, Melroy, O.R., Yee, D., and Sorenson, L.B., Phys. Rev. Lett. 75, 4472 (1995).Google Scholar
15. Shi, Z. and Lipkowski, J., J. Electroanal. Chem. 365, 303 (1994).Google Scholar
16. Shi, Z., Wu, S., and Lipkowski, J., Electrochim. Acta 40, 9 (1995).Google Scholar
17. Avrami, M., J. Chem. Phys. 7, 1103 (1939); 8, 212 (1940); 9, 177 (1941).Google Scholar
18. Bosco, E. and Rangarajan, S.K., J. Chem. Soc. Faraday Trans. 1 77, 1673 (1981).Google Scholar
19. Ramos, R.A., Rikvold, P.A., and Novotny, M.A., in Physical Phenomena at High Magnetic Fields II, edited by Fisk, Z., Gor'kov, L., Meltzer, D., and Schrieffer, R. (World Scientific, Singapore, 1996), p. 380.Google Scholar
20. Ramos, R.A., Sides, S.W., Rikvold, P.A., and Novotny, M.A., in preparation.Google Scholar
21. Hölzle, M.H., Retter, U., and Kolb, D.M., J. Electroanal. Chem. 371, 101 (1994).Google Scholar
22. See numerous references in Barabási, A.-L. and Stanley, H.E., Fractal Concepts in Surface Growth (Cambridge University Press, Cambridge, 1995).Google Scholar