Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-25T17:56:53.544Z Has data issue: false hasContentIssue false
  • English
  • Français

Large-Area Pulsed Laser Deposition of Tantalum Oxide Films

Published online by Cambridge University Press:  10 February 2011

S. Boughaba ,
M. U. Islam ,
G. I. Sproule  and
M. J. Graham
S. Boughaba
Affiliation:
National Research Council CanadaIntegrated Manufacturing Technologies Institute, 800 Collip Circle, London, ON, N6G 4X8
M. U. Islam
Affiliation:
National Research Council CanadaIntegrated Manufacturing Technologies Institute, 800 Collip Circle, London, ON, N6G 4X8
G. I. Sproule
Affiliation:
National Research Council CanadaInstitute for Microstructural Sciences, 1500 Montreal Road, Ottawa, ON, K1A 0R6
M. J. Graham
Affiliation:
National Research Council CanadaInstitute for Microstructural Sciences, 1500 Montreal Road, Ottawa, ON, K1A 0R6
Get access

Abstract

A large-area pulsed laser deposition (PLD) technique was used to uniformly grow tantalum pentoxide (Ta2O5) films on silicon wafers of 75 mm diameter. A KrF excimer laser beam was focused onto a 90 mm diameter Ta2O5 target to induce its ablation in oxygen gas ambient. The large-area coverage was obtained by rastering the laser beam over the radius of the rotating target, while the substrate was rotated simultaneously.

The tantalum oxide films were characterized in terms of uniformity of thickness, composition, structure, and optical properties across the substrate. Average deviations typically below 1% were achieved in thickness, composition, indices of refraction and optical energy band-gap. Identical X-ray diffraction spectra were obtained at the center, middle of radius and edge of the wafers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 567: Symposium R – Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics , 1999 , 527
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 - Pulsed Laser Deposition, edited by Chrisey, D. B. and Hubler, G. K. (John Wiley, New York, 1994).Google Scholar
2 - Greer, J. A., Tabat, M. D., and Lu, C., Nuclear Instr. & Methods in Phys. Res. B121(1-4), 357 (1997).10.1016/S0168-583X(96)00434-XGoogle Scholar
3 - Venkatesan, T., in Pulsed Laser Deposition, edited by Chrisey, D. B. and Hubler, G. K. (John Wiley, New York, 1994), p. 313.Google Scholar
4 - Greer, J. A. and Tabat, M. D., J. Vac. Sci. Technol. A13(3), 1175 (1995).10.1116/1.579857Google Scholar
5 - Greer, J. A. and Tabat, M. D., in Film Synthesis and Growth using Energetic Beams, Mater. Res. Soc. Symp. Proc., Vol. 388, edited by Atwater, H. A., Dickinson, J. T., Lowndes, D. H., and Polman, A. (Mater. Res. Soc., Pittsburgh, 1995), p. 151.Google Scholar
6 - Shinriki, H., Kisu, T., Kimura, S.–I., Nishioka, Y., Kawamoto, Y., and Mukai, K., IEEE Trans. Electron. Dev. 37(9), 1939 (1990).10.1109/16.57154Google Scholar
7 - Shinriki, H. and Nakata, M., IEEE Trans. Electron Dev. 38(1), 455 (1991).10.1109/16.75185Google Scholar
8 - Chu, A. K., Lin, H. C., and Cheng, W. H., J. Electronic Mater. 26(8), 889 (1997).10.1007/s11664-997-0269-3Google Scholar
9 - Traylor-Kruschwitz, J. D. and Pawlewicz, W. T., Appl. Optics 36(10), 2157 (1997).10.1364/AO.36.002157Google Scholar
10 - Rubio, F., Denis, J., Albella, J. M., and Martinez-Duart, J. M., Thin Solid Films 90, 405 (1982).10.1016/0040-6090(82)90545-4Google Scholar
11 - Motohiro, T. and Taga, Y., Appl. Optics 28(13), 2466 (1989).10.1364/AO.28.002466Google Scholar
12 - Hermann, W. C. Jr., J. Vac. Sci. Technol. 18(3), 1303 (1981).10.1116/1.570921Google Scholar
13 - Natishan, P. M., McCafferty, E., Puckett, P. R., and Michel, S., Corrosion Sci. 38(7), 1043 (1996).10.1016/0010-938X(96)00185-0Google Scholar
14 - Ruff, A. W. and Kreider, K. G., Wear 203–204, 187 (1997).10.1016/S0043-1648(96)07410-8Google Scholar
15 - Ghodsi, F. E., Tepehan, F. Z., and Tepehan, G. G., Thin Solid Films 295, 11 (1997).10.1016/S0040-6090(96)09509-0Google Scholar
16 - Sankur, H. O. and Gunning, W., Appl. Optics 28(14), 2806 (1989).10.1364/AO.28.002806Google Scholar
17 - Nishimura, Y., Ujita, H., and Tsuji, M., Appl. Surf. Sci. 89(4), 393 (1995).10.1016/0169-4332(95)00041-0Google Scholar
18 - Nishimura, Y., Shinkawa, A., Ujita, H., Tsuji, M., Nakamura, M., Appl. Surf. Sci. 136, 22 (1998).10.1016/S0169-4332(98)00332-8Google Scholar
19 - Inoue, N., Monnaka, T., Kashiwabara, S., and Fujimoto, R., Appl. Surf. Sci. 127–129, 536 (1998).10.1016/S0169-4332(97)00700-9Google Scholar
20 - Fernandez, F. E. and Marrero, P. J., in Advanced Laser Processing of Materials -Fundamentals and Applications, Mater. Res. Soc. Symp. Proc., Vol. 397, edited by Singh, R., Norton, D., Laude, L., Narayan, J., and Cheung, J. (Materials research Society, Pittsburgh, PA, 1996), p. 205.Google Scholar
21 - Mingfei, Z., Zhengwen, F., Haijun, Y., Zhuangjian, Z., Qizong, Q., Appl. Surf. Sci. 108(3), 399 (1997).10.1016/S0169-4332(96)00605-8Google Scholar
22 - Ooie, T., Yano, T., Yoneda, M., and Katsumura, M., Proc. ICALEO'96, Vol. 81, edited by Duley, W., Shibata, K., and Poprawe, R. (Laser Institute of America, Orlando, 1996) p. 161.Google Scholar
23 - Greer, J. A., in Pulsed Laser Deposition, edited by Chrisey, D. B. and Hubler, G. K. (John Wiley, New York, 1994), p. 293.Google Scholar
24 - Boughaba, S., Islam, M. U., Sproule, G. I., Graham, M. J., to be presented at the International Conference on Metallurgical Coatings and Thin Films, Symposium G, ICMCTF 99, April 12-16, 1999, San Diego, CA.Google Scholar
25 - Chen, L.-C., in Pulsed Laser Deposition, edited by Chrisey, D. B. and Hubler, G. K. (John Wiley, New York, 1994), p. 167.Google Scholar