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Kinetic Monte Carlo Simulation of Dynamic Phenomena in thin Film Growth

Published online by Cambridge University Press:  10 February 2011

M. A. Gallivan ,
R. M. Murray  and
D. G. Goodwin
M. A. Gallivan
Affiliation:
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA 91125, [email protected]
R. M. Murray
Affiliation:
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA 91125, [email protected]
D. G. Goodwin
Affiliation:
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, CA 91125, [email protected]
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Abstract

In this paper we describe the response of a Kinetic Monte Carlo model to time-varying growth conditions. We vary temperature and partial pressure sinusoidally and identify behavior typical of low-dimensional nonlinear systems. In particular, the frequency content of the roughness response is sensitive to the presence of steps in the surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 616: Symposium I – New Methods, Mechanisms & Models of Vapor Deposition , 2000 , 61
Copyright
Copyright © Materials Research Society 2000

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References

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