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Kinetic Limitations in Two-and Three-Dimensional Growth

Published online by Cambridge University Press:  01 February 2011

K. L. Man ,
W. X. Tang ,
Hanchen Huang  and
M. S. Altman
K. L. Man
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Hong Kong
W. X. Tang
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Hong Kong
Hanchen Huang
Affiliation:
Department of Mechanical Engineering, Rensselaer Polytechnic Institute, Troy, New York
M. S. Altman
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Hong Kong
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Abstract

Kinetic limitations related to the Schwoebel-Ehrlich (SE) diffusion barrier are examined in two-(2D) and three-dimensional (3D) growth. It is shown that the realization of step instabilities in 2D growth, possibly caused by the SE barrier, may be hindered by other factors such as step permeability and the relative importance of diffusion and step attachment. Growth shapes of Ag crystallites are also determined that reveal the impact of kinetic limitations. Dramatic changes of growth shape caused by In codeposition suggest that surfactants can modify the 3D SE barrier.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 849: Symposium KK – Kinetics-Driven Nanopatterning on Surfaces , 2004 , KK5.3
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Schwoebel, R.L. and Shipsey, E.J., J. Appl. Phys. 37, 3682 (1966);Google Scholar
Schwoebel, R.L., J. Appl. Phys. 40, 614 (1969).Google Scholar
2. Ehrlich, G. and Hudda, F.G., J. Chem. Phys. 44, 1039 (1966).Google Scholar
3. Bales, G.S. and Zangwill, A., Phys. Rev. B 41, 5500 (1990).Google Scholar
4. Uwaha, M. and Saito, Y., Phys. Rev. Lett. 68, 224 (1992).Google Scholar
5. Kandel, D. and Weeks, J., Phys. Rev. Lett. 69, 3758 (1992)Google Scholar
6. Bena, I., Misbah, C., Valence, A., Phys. Rev. B 47, 7408 (1993).Google Scholar
7. Johnson, M.D., Orme, C., Hunt, A. W., Graff, D., Sudijono, J., Sander, L. M., and Orr, B. G., Phys. Rev. Lett. 72, 116 (1994).Google Scholar
8. Pimpenelli, A., Elkinani, I., Karma, A., Misbah, C., Villain, J., J. Phys. C 6, 2661 (1994).Google Scholar
9. Liu, S. J., Wang, E. G., Woo, C. H., and Huang, H., J. Computer-aided Mater. Design 7, 195 (2001).Google Scholar
10. Liu, S.J., Huang, Hanchen, Woo, C.H., Appl. Phys. Lett. 80, 3295 (2002).Google Scholar
11. See the pioneering works of Kossel and Stranski which are reviewed in Buckley, H.E., Crystal Growth (Wiley, New York, 1951) andGoogle Scholar
Honigmann, B., Gleichgewichts- und Wachtumsformen von Kristallen (Steinkopf Verlag, Darmstadt, 1958).Google Scholar
12. Lagally, Max. G. and Zhang, Zhenyu, Nature 417, 907 (2002).Google Scholar
13. van der Vegt, H.A., van Pinxteren, H.M., Lohmeier, M., Vlieg, E., Thornton, J.M.C., Phys. Rev. Lett. 68, 3335 (1992).Google Scholar
14. Kalff, M., Comsa, G., Michely, T., Phys. Rev. Lett. 81, 1255 (1998).Google Scholar
15. Ozdemir, M. and Zangwill, A., Phys. Rev. B 45, 3718 (1992).Google Scholar
16. Burton, W.K., Cabrera, N. and Frank, F.C., Phil. Trans. Roy. Soc. (London) 243A, 299 (1951).Google Scholar
17. Chernov, A.A., Sov. Phys. Uspekhi 4, 116 (1961).Google Scholar
18. Ghez, R. and Iyer, S.S., IBM J. Res. Develop. 32, 804 (1988).Google Scholar
19. Stoyanov, S., Europhys. Lett. 11, 361 (1990).Google Scholar
20. Chung, W.F. and Altman, M.S., Phys. Rev. B 66, 075338 (2002).Google Scholar
21. Hanbücken, M., Futamoto, M. and Venables, J.A., Surf. Sci. 147, 433 (1984).Google Scholar
22. Tersoff, J., Dernier van der Gon, A.W. and Tromp, R.M., Phys. Rev. Lett. 70, 1143 (1993).Google Scholar
23. Tromp, R.M., Dernier van der Gon, A.W., LeGoues, F.K. and Reuter, M.C., Phys.Rev. Lett. 71, 3299 (1993).Google Scholar
24. Zuo, J.K. and Wendelken, J.F., Phys. Rev. B 56, 3897 (1997), and references therein.Google Scholar
25. Bauer, E., Repts. Prog. Phys. 57, 895 (1994).Google Scholar
26. Chung, W.F. and Altman, M.S., Ultramicroscopy 74, 237 (1998).Google Scholar
27. Tang, W.X., Man, K.L., Huang, H., Woo, C.H. and Altman, M.S., J. Vac. Sci. Technol. B 20, 2492 (2002).Google Scholar