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Ion-Beam Deposition of Thin Films:Influence on Surface and Volume Microstructure

Published online by Cambridge University Press:  22 February 2011

G. A. Al-Jumaily ,
J. J. Mcnally  and
J. R. Mcneil
G. A. Al-Jumaily
Affiliation:
Department of Electrical and Computer Engineering University of New Mexico Albuquerque, New Mexico 87131
J. J. Mcnally
Affiliation:
Department of Electrical and Computer Engineering University of New Mexico Albuquerque, New Mexico 87131
J. R. Mcneil
Affiliation:
Department of Electrical and Computer Engineering University of New Mexico Albuquerque, New Mexico 87131
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Abstract

The effects of ion bombardment during film deposition on surface and volume microstructure were studied. Both metal and dielectric films were investigated. Scattered light and optical constants were examined for evaporated, sputtered and ion assisted films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 47: Symposium C – Thin Films: The Relationship of Structure to Properties , 1985 , 85
Copyright
Copyright © Materials Research Society 1985

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References

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