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Ion Implanted Strip Optical Waveguides in GaAs/GaAl as MQW Material

Published online by Cambridge University Press:  21 February 2011

B. L. Weiss
Affiliation:
Department of Electrical and Electronic EngineeringUniversity of Surrey, Guildford, Surrey GU2 5XH, UK
A. C. Wismayer
Affiliation:
Department of Electrical and Electronic EngineeringUniversity of Surrey, Guildford, Surrey GU2 5XH, UK
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Abstract

This paper is the first report of the use of Si+ implantation into GaAs/GaAlAs MQW material to form optical waveguides operating at a wavelength of 1.15μm. Lateral confinement is achieved by mixing of the MQW material which is produced by the implantation of Si+ and subsequent annealing at 750°C. The properties of these waveguides are compared with those of chemically etched rib waveguides and are shown to have reasonably low losses.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

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