Hostname: page-component-cd9895bd7-q99xh Total loading time: 0 Render date: 2024-12-27T01:38:29.168Z Has data issue: false hasContentIssue false
  • English
  • Français

Ion Current, Energy Distribution, and Radical Species Detection in RF Plasmas by Cylindrical Mirror Analyzer Quadrupole Mass Spectroscopy

Published online by Cambridge University Press:  22 February 2011

Wayne M. Greene ,
Mark A. Hartney ,
Dennis W. Hess  and
William G. Oldham
Wayne M. Greene
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720
Mark A. Hartney
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720
Dennis W. Hess
Affiliation:
Department of Chemical Engineering, University of California, Berkeley, CA 94720
William G. Oldham
Affiliation:
Department of Electrical Engineering and Computer Science, University of California, CA 94720
Get access

Abstract

Mass spectroscopy has been used to diagnose plasma processing atmospheres by detailing the flux of neutral and ion species and the energy distribution of ions impinging upon a substrate immersed in a glow discharge. The institution of a diagnostic tool to investigate the chemical (reactive neutral) and physical (ion) aspects involved in plasma processing is necessary to improve control and reliability in thin film materials processing. Research has focussed on ion-enhanced etching of tungsten thin films in NF3/O2 and the deposition of tungsten by the reaction of WF6 and H2 in rf glow discharge reactions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 117: Symposium C – Process Diagnostics: Materials, Combustion, Fusion , 1988 , 61
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hess, D. W., Ann. Rev. Mater. Sci. 16, 163 (1986).CrossRefGoogle Scholar
2. Gottscho, R. A. and Miller, T. A., Pure and Appl. Chem. 56, 189 (1984).CrossRefGoogle Scholar
3. Picard, A. and Turban, G., Plasma Chem. Plasma Proc. 5(4), 33 (1985).CrossRefGoogle Scholar
4. Greene, W. M., Hartney, M. A., Oldham, W. G., and Hess, D. W., J. Appl. Phys. (1988).Google Scholar
5. Greene, W. M., Hess, D. W., and Oldham, W. G., to be published.Google Scholar
6. Winters, H. F., J. Vac. Sci. Technol. A3(3), 700 (1985).CrossRefGoogle Scholar
7. McConica, C. M. and Krishnamani, K., J. Electrochem. Soc. 133(12), 2542 (1986).CrossRefGoogle Scholar