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Ion beam lithographic fabrication of ordered VO2 nanoparticle arrays

Published online by Cambridge University Press:  15 March 2011

R. Lopez ,
J. Y. Suh ,
L. C. Feldman  and
R. F. Haglund Jr.
R. Lopez
Affiliation:
Department of Physics and Astronomy and Vanderbilt Institute of Nanoscale Science andEngineering Vanderbilt University, Nashville, TN, 37235
J. Y. Suh
Affiliation:
Department of Physics and Astronomy and Vanderbilt Institute of Nanoscale Science andEngineering Vanderbilt University, Nashville, TN, 37235
L. C. Feldman
Affiliation:
Department of Physics and Astronomy and Vanderbilt Institute of Nanoscale Science andEngineering Vanderbilt University, Nashville, TN, 37235
R. F. Haglund Jr.
Affiliation:
Department of Physics and Astronomy and Vanderbilt Institute of Nanoscale Science andEngineering Vanderbilt University, Nashville, TN, 37235
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Abstract

Long-range ordered arrays of vanadium dioxide nanoparticles are fabricated by pulsed laser deposition in a patterned layer of poly(methyl methacrylate) resist. The two- dimensional arbitrary pattern is created by focused ion beam exposure of the resist, followed by pulsed laser deposition and thermal annealing. Interaction of light with the nanoparticles is controlled by their geometrical arrangement as well as by the difference in optical properties displayed between the metallic and semiconducting phases of VO2. Arrays like this open opportunities to study optical resonances and interactions for nanoparticles in close proximity, in the framework of the metal-semiconductor phase transition in VO2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 820: Symposia O/R – Nanoengineered Assemblies and Advanced Micro/Nanosystems , 2004 , R1.5
Copyright
Copyright © Materials Research Society 2004

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