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Ion Beam Induced Graphitization ofPhenolformaldehyde

Published online by Cambridge University Press:  15 February 2011

D. Ila ,
A. L. Evelyn  and
G. M. Jenkins
D. Ila
Affiliation:
Center for Irradiation of Materials, Alabama A&M University, P.O. Box 1447, Normal, AL 35762–1447, U.S.A.
A. L. Evelyn
Affiliation:
Center for Irradiation of Materials, Alabama A&M University, P.O. Box 1447, Normal, AL 35762–1447, U.S.A.
G. M. Jenkins
Affiliation:
Center for Irradiation of Materials, Alabama A&M University, P.O. Box 1447, Normal, AL 35762–1447, U.S.A.
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Abstract

We have studied MeV ion beam induced phase transformation inphenolformaldehyde cured at 170°C by both Raman Microprobe spectroscopy and in situ resistance measurement of the irradiated area.Samples were irradiated using various doses of protons, alphas and nitrogenbeams. Irradiated volumes in each sample were tested in situ for enhanced electrical conductivity and later on by RamanMicroprobe spectroscopy. The results have shown changes in the resistance asmuch as seven orders of magnitude by alpha particles, six orders by nitrogenbombardment and three orders by hydrogen. Raman Microprobe spectroscopy ofthe darkened phase shows development of the D- and G-lines which arecharacteristic of the production of a carbonized resin. These spectraindicate that maximum carbonization was caused by the nitrogen beam.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 321: Symposium E – Crystallization and Related Phenomena in Amorphous Materials—Ceramics, Metals, Polymers, and Semiconductors , 1993 , 441
Copyright
Copyright © Materials Research Society 1994

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References

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