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Investigations of Sputtered Silver Oxide Deposits for the SUPER–RENS High Density Optical Data Storage Application

Published online by Cambridge University Press:  21 March 2011

Dorothea Büchel ,
Christophe Mihalcea ,
Toshio Fukaya ,
Nobufumi Atoda  and
Junji Tominaga
Dorothea Büchel
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Laboratory for Advanced Optical Technology (LAOTEC), Tsukuba Central Research Site 4, 1-1-1 Higashi, Tsukuba-city, Ibaraki 305-8562, Japan
Christophe Mihalcea
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Laboratory for Advanced Optical Technology (LAOTEC), Tsukuba Central Research Site 4, 1-1-1 Higashi, Tsukuba-city, Ibaraki 305-8562, Japan
Toshio Fukaya
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Laboratory for Advanced Optical Technology (LAOTEC), Tsukuba Central Research Site 4, 1-1-1 Higashi, Tsukuba-city, Ibaraki 305-8562, Japan
Nobufumi Atoda
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Laboratory for Advanced Optical Technology (LAOTEC), Tsukuba Central Research Site 4, 1-1-1 Higashi, Tsukuba-city, Ibaraki 305-8562, Japan
Junji Tominaga
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Laboratory for Advanced Optical Technology (LAOTEC), Tsukuba Central Research Site 4, 1-1-1 Higashi, Tsukuba-city, Ibaraki 305-8562, Japan
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Abstract

Thin silver oxide films used as mask layers in super-Resolution Nearfield Structure (super-RENS) disks for high density optical data storage were reactively sputter-deposited and their composition was determined by spectroscopic means. We found that the stoichiometry of the films changed with the oxygen content in the sputtering gas atmosphere. With a stepwise increase in the percentage of O2 from 0 - 100%, the corresponding layers consist of Ag, mixtures of Ag and Ag2O, Ag2O, mixtures of Ag2O and AgO and AgO. Laser activation of such oxidic phase containing deposits results in the decomposition of the material and excitation of strong local plasmons in the remaining silver clusters. This was confirmed by acquiring surface enhanced Raman spectra (SERS) of benzoic acid (BA), copper phthalocyanine (CP) and internal carbon impurities on silver oxide substrates. From this data, we conclude that the sub-wavelength resolution obtained in super-RENS disks is mediated by local surface plasmons on small silver particles forming in the mask layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 674: Symposia T/U/V – Applications of Ferromagnetic and Optical Materials, Storage and Magnetoelectronics , 2001 , V3.2
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

[1]Fuji, H., Tominaga, J., Men, L., Nakano, T., Katayama, H., and Atoda, N., Jpn. J. Appl. Phys., 39(I, 2B), 980, 2000.Google Scholar
[2]Kim, J. H., Büchel, D., Nakano, T., Tominaga, J., Atoda, N., Fuji, H., and Yamakawa, Y., Appl. Phys. Lett., 77, 1774, 2000.Google Scholar
[3]Tominaga, J., Mihalcea, C., Büchel, D., Fukuda, H., Nakano, T., Atoda, N., Fuji, H., and Kikukawa, T., Appl. Phys. Lett., 78, in press, 2001.10.1063/1.1367905Google Scholar
[4]Fleischmann, M., Hendra, J. P., and McQuillan, A. J., Chem. Phys. Lett., 26, 163, 1974.Google Scholar
[5]Creighton, J. A., Blatchford, C. G., and Albrecht, M. G., J. Chem. Soc. Faraday Trans., 2(75), 790, 1979.10.1039/f29797500790Google Scholar
[6]Büchel, D., Tominaga, J., Fukaya, T., and Atoda, N., J. Magn. Soc. Japan, 25(3-2), 240, 2001.Google Scholar
[7]Hamilton, J. C., Farmer, J. C., and Anderson, R. J., J. Electrochem. Soc., 133(4), 739, 1986.Google Scholar
[8]Tsang, J. C., Demuth, J. E., Sanda, P. N., and Kirtley, J. R., Chem. Phys. Lett., 76(1), 54, 1980.Google Scholar
[9]Moyer, P. J., Schmidt, J., Eng, L. M., and Meixner, A. J., J. Am. Chem. Soc., 122, 5409, 2000.10.1021/ja000703gGoogle Scholar
[10]Schmidt, A. A., Oermann, J., and Anton, R., Thin Solid Films, 281–282, 105, 1996.Google Scholar
[11]Moskowits, M., Rev. Mod. Phys., 57(3-1), 783, 1985.Google Scholar