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Investigation of Low Angle Grain Boundaries in Hexagonal Silicon Carbide

Published online by Cambridge University Press:  01 February 2011

Yi Chen
Affiliation:
[email protected], Stony Brook University, Materials Science and Engineering, 314 Old Engineering, Department of Materials Science and Engineering, Stony Brook University, Stony Brook, NY, 11794-2275, United States, 6316328501, 6316328052
Hui Chen
Affiliation:
[email protected], Stony Brook University, Materials Science and Engineering, Stony Brook, NY, 11794-2275, United States
Ning Zhang
Affiliation:
[email protected], Stony Brook University, Materials Science and Engineering, Stony Brook, NY, 11794-2275, United States
Michael Dudley
Affiliation:
[email protected], Stony Brook University, Materials Science and Engineering, Stony Brook, NY, 11794-2275, United States
Ronghui Ma
Affiliation:
[email protected], University of Maryland Baltimore County, Mechanical Engineering, Baltimore, MD, 21250, United States
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Abstract

Interaction between basal plane dislocations and single or well-spaced threading dislocations is discussed based on synchrotron white beam X-ray topographic studies carried out on physical vapor transport grown hexagonal silicon carbide single crystals. The basal plane dislocations are able to cut through single or well-spaced threading edge dislocations even if the formation of kinks/jogs is energetically unfavorable while threading screw dislocations were mostly observed to act as effective pinning points. However, basal plane dislocations can sometimes cut through a threading screw dislocation, forming a superjog and which subsequently migrates on the prismatic plane via a cross-slip process. Threading edge dislocation walls act as obstacles for the glide of basal plane dislocations and the mechanism by which this occurs is discussed. The character of low angle grain boundaries and their dislocation content are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

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