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Intrasubband 1.55 μm Electrooptical Modulation in SiGe Asymmetric Quantum Well Structures

Published online by Cambridge University Press:  25 February 2011

Lionel R. Friedman  and
Richard A. Soref
Lionel R. Friedman
Affiliation:
National Science Research Council, Senior Fellow
Richard A. Soref
Affiliation:
USAF Rome Laboratory, RL/EROC, Hanscom Air Force Base, MA 01731
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Abstract

A new, fast, intrasubband 1.55 μm electrooptic modulator in the SiGe/Si/CaF2-on-Si steppedquantum- well system is proposed and analyzed. At electric fields of ±8 V/μm, resonant 1-3 conduction intrasubband absorption is predicted to give 18 dB of optical extinction for narrow-linewidth transitions. We expect this field effect modulator to have microwave response, plus compatibility with Si-based optoelectronic integration.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 298: Symposium B – Silicon-Based Optoelectronic Materials , 1993 , 63
Copyright
Copyright © Materials Research Society 1993

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References

1. Fejer, M.M, Yoo, S.J.R., Beyer, R.L., Harwit, A., and Harris, J.S. Jr., Phys. Rev. Lett., 62, 1041 (1989)Google Scholar
2. Khurgin, J., J. Opt. Soc. Am. B6, 1673, (1989)Google Scholar
3. Friedman, L. and Soref, R. A., Electronics Letters, 22, 819, (1986)Google Scholar
4. Karunisari, R.P.L., Mii, Y.J., and Wang, K.L., IEEE Electron Devics Letters, 11, 227, (1990)CrossRefGoogle Scholar
5. Ando, T., Fowler, A.B., and Stern, F., Rev. Mod. Phys., 54, 460, (1982)Google Scholar
6. Walle, C.G. Van de and Martin, R.M., Phys. Rev. B4, 5621, (1986)Google Scholar
7. Schowalter, L.J. and Fathauer, R.W., CRC Critical Reviews, 15, 367,(1989)Google Scholar
8. Hertle, H., Schaffler, F., Zrenner, A., Abstreiter, G., and Gornik, E., Thin Solid Films, 222, 20, (1992)Google Scholar