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In-Situ Spectroscopy of Ion-Induced Photon Emission During Metal Nanoparticle Formation in Silica Glass with High-Flux Cu Implantation

Published online by Cambridge University Press:  10 February 2011

Thi Thi Lay ,
H. Amekura ,
Y. Takeda  and
N. Kishimoto
Thi Thi Lay
Affiliation:
National Rese arch Institute for Metals, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, [email protected]
H. Amekura
Affiliation:
National Rese arch Institute for Metals, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
Y. Takeda
Affiliation:
National Rese arch Institute for Metals, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
N. Kishimoto
Affiliation:
National Rese arch Institute for Metals, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Abstract

Ion-induced photon emission from a silica glass irradiated with high-flux Cu ions was measured in a wavelength range from 450 nm to 800 nm, while nanoyarticles spontaneously formed in the silica glass. Current density was varied up to 100 µA/cm2 at a constant total dose of 3×106ions/cm2. The photon emission primarily arose from the vicinity of the substrate surface and consisted of sharp peaks due to neutral and singly-ionized species, Cu(I), Cu(II) and Si(II) ions, as well as a broad-band background. Intensity of Si(II) and Cu(I) increased with increasing current density. On the other hand, Cu(II) did not show a monotonic increase, decreasing around 100 µA/cm2. Measurements of in-situ EDX and ex-situ RBS were also conducted to study the relevant mechanisms. The ion-induced photon emission was attributed to recombination processes of sputtered ions and electrons in the plasma, induced by the high-flux Cu beam.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 569: Symposium U – In Situ Process Diagnostics and Modelling , 1999 , 191
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

[1] Kishimoto, N., Gritsyna, V.T., Kono, K., Amekura, H. and Saito, T., Nucl. Instrum. Methods in Phys. Res. B127/128, 579(1997).10.1016/S0168-583X(96)01132-9Google Scholar
[2] Ishikawa, J., Tsuji, H., Ikeda, S., Gotoh, Y., Nucl. Instrum. Methods in Phys. Res. B127/128, 282(1997).10.1016/S0168-583X(96)00940-8Google Scholar
[3] Takeda, Y., Gritsyna, V.T., Umeda, N., Lee, C.G. and Kishimoto, N., Nucl. Instrum. Methods in Phys. Res. B148, 1029(1999).10.1016/S0168-583X(98)00747-2Google Scholar
[4] Kishimoto, N., Umeda, N., Takeda, Y., Lee, C.G. and Gritsyna, V.T., Nucl. Instrum. Methods in Phys. Res. B148, 1017(1999).10.1016/S0168-583X(98)00876-3Google Scholar
[5] Ctsuki, N., Tanabe, T., J. Nucl. Materials. 212–215, 1339(1994).Google Scholar
[6] Lee, C.H., Chang, Y. C., Chang, Y. H., Nucl. Instrum. Methods in Phys. Res. B149 294(1999).10.1016/S0168-583X(98)00897-0Google Scholar
[7] Verbeek, H., J. Appl. Phys, 46–7,2981(1975).10.1063/1.322038Google Scholar
[8] Ishikawa, I., J. Ion Sci. and Tech. 23–1, 1 (1997).Google Scholar
[9] CRC Handbook of Chemistry & Physics, edited by Weast, R. C., Astle, M. J., Beyer, W. H., (CRC Press, Inc., Boca, Raton, Florida 68th., Edition,1987-1988), E233.Google Scholar
[10] Comichi, T. and Nakahara, T., Spectra of atoms ( Japan spectroscopic society, measuring methods series No. 19; Japan academic press center, 1989), 41 Google Scholar
[11] Tanimura, K., Itoh, C. and Itoh, N., J. Phys. C: Solid State Phys. 21, 1869 (1988).10.1088/0022-3719/21/9/026Google Scholar
[12] Fiori, C. and Devine, R.A.B., Phys. Rev. Lett. 52, 2081 (1984).10.1103/PhysRevLett.52.2081Google Scholar
[13] Devine, R.A.B., Nucl. Instrum. Methods in Phys. Res. B1, 378 (1994).10.1016/0168-583X(94)96253-7Google Scholar