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In-Situ Gas Conversion Using a Wide Area Disc Shaped He-H2 Plasma and Organometallic Feedstocks

Published online by Cambridge University Press:  21 February 2011

B. Pihlstrom
Affiliation:
Dept. Electrical Engineering, Colorado State University, Fort Collins, CO 80523
T. Sheng
Affiliation:
Dept. Electrical Engineering, Colorado State University, Fort Collins, CO 80523
Z. Yu
Affiliation:
Dept. Electrical Engineering, Colorado State University, Fort Collins, CO 80523
G. Collins
Affiliation:
Dept. Electrical Engineering, Colorado State University, Fort Collins, CO 80523
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Abstract

A wide area disc shaped plasma source of 20cm in diameter generated by a ring shaped cathode electron beam is used to decompose Trimethylgallium (TMGa) and Trimethylarsenic (TMAs). Volume photo-absorption of VUV photons and sensitized atom-molecule collisions with excited species and radicals can all assist dissociation of the organometallic feedstock reactants. In addition, the excited radical flux and VUV impingement on the film may also assist heterogeneous surface reactions and increase surface mobility of absorbed species. Mass spectrometry studies using deuterium as a replacement for hydrogen as a trace gas allowed for the elicidation of decomposition pathways of TMGa and TMAs. Byproducts of hydrogen and helium plasmas were also studied.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

1. Sheng, T. Y., Yu, Z. Q., and Collins, G. J., Appl. Phys. Lett. 52, 576 (1988) and H. Zarnani, Z. Q. Yu, G. J. Collins, E. Bhattacharya, and J. I. Pankove, Appl. Phys. Lett. 53, 1314 (1988).Google Scholar
2. Deitze, W.T, Ludowise, M. J., and Cooper, C. B., Electron. Lett. 17, 698 (1981).Google Scholar
3. Kou, C. P., Cohen, R. M., and Stringfellow, G. B., J. Cryst. Growth 64, 461 (1983).Google Scholar
4. Blaauw, C., Miner, C., Emmerstorfer, B., SpringThrope, A. J., and Gallant, M., Can. J. Phys. 63, 664 (1985).Google Scholar
5. Vook, D.W, Reynolds, S., and Gibbons, J. F., Appl. Phys. Lett. 50, 1386 (1987).Google Scholar
6. Fraas, L. M., Mcleod, P. S., Weiss, R. E., Partain, L., and Cape, J. A., J. Appl. Phys. 62, 299 (1987).Google Scholar
7. Stringfellow, G. B., J. Electronic Mater. 17, 327 (1988).Google Scholar
8. Kuech, T. F. and Potemski, R., J. Cryst. Growth 68, 148 (1984).Google Scholar
9. Lum, R. M., Klingert, J. K., Kisker, D. W., Abys, S. M., and Stevie, F. A., J. Cryst. Growth 93, 120 (1988).Google Scholar
10. Lee, P. W., Olmstead, T. R., McKenna, D. R., and Jensen, K. F., J. Cryst. Growth 85, 165 (1987).Google Scholar
11. Lee, P. W., Olmstead, T. R., McKenna, D. R., and Jensen, K. F., J. Cryst. Growth 85, 165 (1987).Google Scholar
12. Larsen, C. A., Buchan, N. I., and Stringfellow, G. B., Appl. Phys. Lett. 52, 48 (1988).Google Scholar
13. Yoshida, M., Watanabe, H., and Uesugi, F., J. Electrochem. Soc. 132, 677 (1985).Google Scholar
14. McCrary, V., Donnelly, V. M., Brasen, D., Applebaum, A., and Farrow, R. C., Mater. Res. Soc. Symp Proc. 75, 223 (1987).Google Scholar
15. Sheng, T., Pihlstrom, B., Yu, Z., and Collins, G., Appl. Phys. Lett. To be published in November 1989 and B. Pihlstrom. T. Sheng, and G. Collins, submitted to Appl. Phys. Lett.Google Scholar
16. Gaskill, D. K., Kolubayev, V., Botta, N., Sillman, R. S., and Butler, J. E., J. Cryst. Growth 93, 127 (1988).Google Scholar
17. Slanger, T. G. and Black, G., J. Chem. Phys. 77, 2432 (1982).Google Scholar
18. Rebbert, R. E., Lias, S. G., and Ausloos, P., Chem. Phys. Lett. 12, 323 (1971).Google Scholar
19. Lum, R. M., Klingert, J. K., Kisker, D. W., Tennant, D. M., Morris, M. D., Malm, D. L., Kovalchick, J., and Helmbrook, L. A., J. Electronic. Mater. 17, 101 (1988).Google Scholar
20. Lafferty, F. W. and Stauffer, D. B., The Wiley/NBS Registry of Mass Spectral Data, (J. Wiley and Sons, New York, 1989), pg. 118.Google Scholar
21. Larsen, C. A., Buchan, N. I., Li, S. H., and Stringfellow, G. B., J. Cryst. Growth 93, 15 (1988).Google Scholar