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Initial Phase formation at the Interface of Ni, Pd, or Pt and Si

Published online by Cambridge University Press:  22 February 2011

R. J. Nemanich ,
C. C. Tsai ,
B. L. Stafford ,
J. R. Abelson  and
T. W. Sigmon
R. J. Nemanich
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
C. C. Tsai
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
B. L. Stafford
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
J. R. Abelson
Affiliation:
Standford Electronics Laboratory, Standford, CA 94305
T. W. Sigmon
Affiliation:
Standford Electronics Laboratory, Standford, CA 94305
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Abstract

The initial phase formation at the interface of the near noble metals (Ni, Pd, and Pt) and Si is studied by Raman spectroscopy and Rutherford ion-backscattering. The results show that a crystalline Pd2Si forms immediately at the interface of Pd and Si while a disordered intermixed phase of composition ∼M2Si forms for Ni and Pt at 150°C. The results are discussed in terms of the disorder due to the kinetic process and the stability of the crystalline phase.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 25: Symposium C – Thin Films and Interfaces II , 1983 , 9
Copyright
Copyright © Materials Research Society 1984

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References

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