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Published online by Cambridge University Press: 10 February 2011
Process monitoring and control during semiconductor device fabrication frequently relies on good knowledge of the optical properties of the substrate wafer and the surface coatings. However, these optical data are often unavailable, and as a consequence errors arise in pyrometric temperature measurements, as well as in thermal modelling of heating cycles. In this study, isothermal electron beam heating has been combined with in situ optical measurements to record thermal emission spectra of undoped InP specimens from 347 to 478°C, at wavelengths between I and 9 μm. The absorption coefficient was deduced from the emission spectra and reveals information about the temperature dependence of the infrared absorption mechanisms in InP.