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The Influence of Surface Morphology and Oxide Microstructure on the Nucleation and Growth of Uranium Hydride on Alpha Uranium

Published online by Cambridge University Press:  10 February 2011

R. J. Hanrahan Jr. ,
M. E. Hawley  and
G. W. Brown
R. J. Hanrahan Jr.
Affiliation:
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, NM 87545
M. E. Hawley
Affiliation:
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, NM 87545
G. W. Brown
Affiliation:
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

While the bulk kinetics of the uranium-hydrogen reaction are well understood, the mechanisms underlying the initial nucleation of uranium hydride on uranium remain controversial. In this study we have employed environmental cell optical microscopy, Scanning Electron Microscopy (SEM) and Atomic Force Microscopy, (AFM) in an attempt to relate the structure of the surface and the microstructure of the substrate with the susceptibility and site of hydride nucleation. Samples have been investigated with varying grain size, inclusion (carbide) concentration, and thermal history. There is a clear correlation to heat treatment immediately prior to hydrogen exposure. Susceptibility to hydride formation also appears to be related to impurities in the uranium. The oxidized surface is very complex, exhibiting wide variations in thickness and topography between samples, between grains in the same sample, and within individual grains. It is, however, very difficult to relate this fine scale variability to the relatively sparse hydride initiation sites. Therefore, the surface oxide layer itself does not appear to control the sites where hydride attack is initiated, although it must play a role in the induction period prior to hydride initiation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 513: Symposium H – Hydrogen in Semiconductors and Metals , 1998 , 43
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1) Albrecht, W. M., and Mallet, M. W., J. Electrochem. Soc., 105/10, 610–11 (1958).Google Scholar
2) Alire, R. M., Mueller, B. A., Peterson, C. L., and Mosley, J. R., J. Chem. Phys., 52, 37–46, (1970).Google Scholar
3) Bloch, J., and Mintz, M. H., J. Less Comm. Met., 166, 241–51, (1990).Google Scholar
4) Owen, L. W. and Scudmore, R. A., Corr. Sci., 6, 461–8, (1966).Google Scholar
5) Bloch, J., Swissa, E., and Mintz, M. H., Zeit. Phy. Chem., N. F. 164, 1193–98, (1989).Google Scholar
6) Bloch, J., Simca, E., Kroup, M., Stem, A., Shmariahu, D., and Mintz, M. H.,, J. Less Comm. Met, 103, 163–71 (1984).Google Scholar
7) Condon, J. B., , J. Phys. Chem, 79/4, 392–6, (1975).Google Scholar
8) Moreno, et al. J. Nuc. Mat. 230, 181–86 (1996).Google Scholar
9) Digital Instruments, 112 Robin Hill Rd., Santa Barbara, CA, USA 93117Google Scholar
10) Holden, A. N., Physical Metallurgy of Uranium, Addison-Wesley, Reading Massachusetts, 1958. p. 218–23 .Google Scholar