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Influence of size variation on the strain distribution in YSZ membranes on Si substrates

Published online by Cambridge University Press:  15 January 2013

Florian Kuhl
Affiliation:
I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany.
Markus Piechotka
Affiliation:
I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany.
Daniel Reppin
Affiliation:
I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany.
Torsten Henning
Affiliation:
I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany.
Juergen Janek
Affiliation:
Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Gießen, Germany.
Peter J. Klar
Affiliation:
I. Physikalisches Institut, Justus-Liebig-Universität, Gießen, Germany.
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Abstract

The oxygen conductor yttria-stabilized-zirconia (YSZ) is widely used in miniaturized solid oxide fuel cells (µSOFC) and may be suitable for solid state ion emitter applications e.g. as miniaturized ion engines for electric propulsion. Since the YSZ films are not completely free of stress during the growth, cracks in fabricated free-standing membranes are often observed.

YSZ thin films were deposited on silicon substrates by radio frequency sputtering. Free-standing YSZ membranes were fabricated by partially removing the Si substrate by anisotropic wet-chemical etching using different masking patterns defined by electron beam lithography. We show how different sizes and etching conditions influence the strain in the fabricated membranes. To characterize these membranes we used optical microscopy and scanning electron microscopy.

Type
Articles
Copyright
Copyright © Materials Research Society 2013

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