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The Influence of Magnetic Fields on the Properties of Amorphous Carbon Prepared by Plasma Deposition

Published online by Cambridge University Press:  25 February 2011

R. H. Jarman  and
A. T. Howe
R. H. Jarman
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
A. T. Howe
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
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Abstract

Amorphous carbon films exhibit a wide range of optical, electrical and mechanical properties which make them candidates for a number of applications such as protective coatings and insulators in electronic devices. We describe the effects of a magnetic field applied at the powered electrode in a capacitively coupled rf discharge on the optical and electrical properties of amorphous carbon films deposited on substrates mounted on both electrodes. In the case of substrates placed on the powered electrode, the film properties appear to be very sensitive to the magnetic field strength. At the highest magnetic field, the deposition rates are very much higher than those obtained in the absence of a magnetic field. The optical gap varies from 1.1 eV to 2.7 eV depending on the deposition conditions. The electrical conductivities of the films are very low and show a complex dependence on the applied electric field.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 273
Copyright
Copyright © Materials Research Society 1987

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References

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