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Influence of Hydrogen Plasma Treatment Upon Native Oxides Plasma Grown on INP

Published online by Cambridge University Press:  22 February 2011

E. D. Belyakova ,
S. V. Belyakov ,
L. S. Berman ,
A. T. Gorelenok ,
I. N. Karimov ,
R. V. Karzhavin ,
I. A. Mokina  and
N. M. Shmidt
E. D. Belyakova
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
S. V. Belyakov
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
L. S. Berman
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
A. T. Gorelenok
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
I. N. Karimov
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
R. V. Karzhavin
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
I. A. Mokina
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
N. M. Shmidt
Affiliation:
Ioffe Physical Technical Institute, Polytechnicheskaya 26, St-Petersburg, 194021 Russia
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Extract

Investigations of plasma grown native oxides on indium phosphide carried out recently [1,2] have shown that these oxides exhibit properties which are promising to be used in MIS structures on InP, due to their stable composition which includes [InxPyOz]n polyphosphate phase mainly and due to reduced density of interface states (Nss<1011 eV−1 cm−2). It has been shown also that MIS structures with plasma native oxides exhibit C-V characteristics shifted towards positive values of voltage bias. The flat band shift is assigned to a negative charge injected into oxide film during plasma oxidation. The presence of this negative charge in plasma grown native oxides on InP may cause instability of electric properties of MIS structures [2].

The aim of this work was to make an attempt to influence upon negative effective oxide charge density by means of hydrogen plasma treatment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 284: Symposium G – Amorphous Insulating Thin Films , 1992 , 625
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

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