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Indentation Creep Analysis of Amorphous Nitrogen-Containing Carbon Films

Published online by Cambridge University Press:  10 February 2011

Daisuke Tanaka ,
Shigeo Ohshio  and
Hidetoshi Saitoh
Daisuke Tanaka
Affiliation:
Department of Chemistry, Nagaoka University of Technology, Ngaoka Niigata, 940-21 JAPAN
Shigeo Ohshio
Affiliation:
Department of Chemistry, Nagaoka University of Technology, Ngaoka Niigata, 940-21 JAPAN
Hidetoshi Saitoh
Affiliation:
Department of Chemistry, Nagaoka University of Technology, Ngaoka Niigata, 940-21 JAPAN
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Abstract

An indentation creep analysis has been performed to investigate micro-mechanical properties of amorphous nitrogen-containing carbon films. Using results of the slope of the time-displacement relation of creep procedure, the strain rate sensitivity exponent m is obtained. The m value of 0.004 was obtained for diamond-like carbon film without nitrogen. In contrast, those were found to be in the range between 0.009 and 0.101 for nitrogen-containing carbon films. These slightly increased with increasing the nitrogen content of the films. We present results that indicate that the nano-indentation creep technique enables clarification of the nano-structure of nitrogen-containing carbon films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 205
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

[1]Kamata, K., Inoue, T., Sugai, K., Saitoh, H. and Maruyama, K.: J.Appl. Phys. 78 (1995) 1394.Google Scholar
[2]Maruyaxna, K., Inoue, T., Yamamoto, M., Morinaga, T., Saitoh, H. and Kamata, K.: J.Mater.Sci.Lett. 13 (1994) 1793.Google Scholar
[3]Weissmantel, C.: Thin Films From Free Atoms and particles (Academic, New York, 1985), pp. 153–201.Google Scholar
[4]Mori, T. and Namba, Y.: J. Appl. Phys. 55 (1984) 3276.Google Scholar
[5]Lifshitz, Y., Kasi, S.R. and Rabalais, J. W.: Phys. Rev. Lett. 62 (1982) 1290.Google Scholar
[6]Saitoh, H., Inoue, T. and Ohshio, S.: Jpn. J. Appl. Phys., submitted.Google Scholar
[7]Spaepen, F.: Acta Metall. 25 (1977) 407.Google Scholar
[8]Argon, A. S.: Acta Metall. 27 (1979) 47.Google Scholar
[9]Han, W. T. and Tomozawa, M.: J.Am. Ceram. Soc. 73 (1990) 3626.Google Scholar
[10]Kamata, K., Inoue, T., Maruyama, K. and Tanabe, T.: Jpn. J. Appl. Phys. 29 (1990)Google Scholar
[11]Inoue, T., Ohshio, S., Saitoh, H. and Kamata, K.: Appl.Phys.Lett. 67 (1995) 353.Google Scholar
[12]Kaufman, J. H., Metin, S. and Saperstein, D. D.: Phys. Lev. B39 (1989) 5805.Google Scholar
[13]Marsh, D.M.: Proc. R. Soc. London A 282 (1964) 33Google Scholar