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In situ X-ray Reflectivity Study of Oxidation Kinetics in Iron and Stainless steel

Published online by Cambridge University Press:  01 February 2011

D. H. Kim ,
S. S. Kim ,
H. H. Lee ,
H. W. Jang ,
J. W. Kim ,
M. Tang ,
K. S. Liang ,
S. K. Sinha  and
D. Y. Noh
D. H. Kim
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
S. S. Kim
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
H. H. Lee
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
H. W. Jang
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
J. W. Kim
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
M. Tang
Affiliation:
Synchrotron Radiation Research Center, Hsinchu, Taiwan 300, Taiwan
K. S. Liang
Affiliation:
Synchrotron Radiation Research Center, Hsinchu, Taiwan 300, Taiwan
S. K. Sinha
Affiliation:
Department of Physics, University of California at San Diego, CA 92093, USA
D. Y. Noh
Affiliation:
Department of Materials Science and Engineering, Gwangju Institute of Science & Technology (K-JIST), Gwangju 500–712, Republic of Korea
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Abstract

In situ specular x-ray reflectivity was applied to study the growth kinetics of passive oxide films on iron and stainless steel substrates in pH 8.4 borate buffer solution. Under electrical potential from 0 to 800 mV, the growth rate of oxide films decreases exponentially in thickness following the direct logarithmic growth law predicted in the point defect model. The electric field in the oxide on iron is independent of the applied potentials consistent with the point defect model. In stainless steel, however, the electric field depends strongly on the applied potential indicating that the oxide properties change as the applied potential varies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 840: Symposium Q – Neutron and X-Ray Scattering as Probes of Multiscale Phenomena , 2004 , Q4.8
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Cabrera, N. and Mott, N. F., Rep. Prog. Phys. 12, 163 (1948∼1949)Google Scholar
2. Chao, C. Y., Lin, L. F. and Macdonald, D. D., J. Electrochem. Soc. 128, 1187 (1981)Google Scholar
3. Zhang, L., Macdonald, D. D., Sikora, E. and Sikora, J., J. Electrochem. Soc. 145, 898 (1998)Google Scholar
4. Vetter, K. J., Electrochim. Acta 16, 1923 (1971)Google Scholar
5. Kirchheim, R., Electrochim. Acta 32, 1619 (1987)Google Scholar
6. Goswami, K. N. and Staehle, R. W., Electrochim. Acta 16, 1895 (1971)Google Scholar
7. Silverman, S., Cragnolino, G. and Macdonald, D. D., J. Electrochem. Soc. 129, 2419 (1982)Google Scholar
8. Olsson, C.-O. A., Hamm, D. and Landolt, D., J. Electrochem. Soc. 147, 4093 (2000)Google Scholar
9. You, H., Melendres, C. A., Nagy, Z., Maroni, V. A., Yun, W. and Yonco, R. M., Phys. Rev. B 45, 11288 (1992)Google Scholar
10. Büchler, M., Schmuki, P. and Böhni, H., J. Electrochem. Soc. 145, 609 (1998)Google Scholar
11. Bardwell, J. A., Sproule, G. I. and Graham, M. J., J. Electrochem. Soc. 140, 50 (1993)Google Scholar
12. Oblonsky, L. J., Ryan, M. P. and Isaacs, H. S., J. Electrochem. Soc. 145, 1922 (1998)Google Scholar
13. Kim, D. H., Lee, H. H., Kim, S. S., Kang, H. C., Kim, H., Sinha, S. K. and Noh, D. Y., Appl. Phys. Lett. in press.Google Scholar
14. Parratt, L. G., Phys. Rev. 95, 359 (1954)Google Scholar
15. Tolan, M., X-ray Scattering from Soft-Matter Thin Films, Springer Tracts in Modern Physics Vol. 148 (Springer, Berlin, 1999)Google Scholar
16. Ghez, R., J. Chem. Phys. 58, 1838 (1973)Google Scholar
17. Macdonald, D. D. and Urquidi-Macdonald, M., J. Electrochem. Soc. 137, 2395 (1990)Google Scholar
18. Bardwell, J. A., Sproule, G. I., Macdougall, B. R., Graham, M. J., Davenport, A. J. and Isaacs, H. S., J. Electrochem. Soc. 139, 371 (1992)Google Scholar