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In Situ Real-Time Studies of Oxygen Incorporation in Complex Oxide Thin Films Using Spectroscopic Ellipsometry and Ion Scattering and Recoil Spectrometry

Published online by Cambridge University Press:  10 February 2011

A.H. Mueller
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
Y. Gao
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
E.A. Irene
Affiliation:
Department of Chemistry, University of North Carolina at Chapel Hill
O. Auciello
Affiliation:
Material Science and Chemistry Division, Argonne National Laboratory
A.R. Krauss
Affiliation:
Material Science and Chemistry Division, Argonne National Laboratory
J.A. Schultz
Affiliation:
Ionwerks Inc., Houston, Texas
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Abstract

The surface termination of c-axis oriented YBa2Cu3O7-δ (YBCO) and the oxygen incorporation mechanism has been investigated using a unique combination of spectroscopic ellipsometry (SE) and time of flight ion scattering and recoil spectrometry (ToF-ISARS). The high surface sensitivity of the ToF-ISARS technique combined with the bulk oxygen sensitivity of SE are shown to yield complimentary information. The SE provided the film orientation and quality, while ToF-ISARS supplied surface compositional and structural information and enabled isotopic 18O tracer studies. It was determined that the 0 content of the film had little effect on the surface termination of the film, indicating a lack of labile Cu(l) sites at the c-axis oriented YBCO surface. Also, strong evidence for a Ba or BaO terminated structure is shown. The data related to the 18O tracer studies indicate that O from the reaction ambient incorporates only into the labile Cu(1) sites during both deposition and annealing, while stable O sites were populated with O from the sputtered target, indicating either the need for sputtered atomic O or sputtered YCuO complexes to occupy the stable Cu(2) sites.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

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