Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-29T07:23:53.717Z Has data issue: false hasContentIssue false
  • English
  • Français

In Situ Heteroepitaxial Bi2Sr2CaCu2O8 Thin Films Prepared by Metalorganic Chemical Vapor Deposition

Published online by Cambridge University Press:  15 February 2011

Frank Dimeo Jr. ,
Bruce W. Wessels ,
Deborah A. Neumayer ,
Tobin J. Marks ,
Jon L. Schindler  and
Carl R. Kannewurf
Frank Dimeo Jr.
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Materials Science and Engineering
Bruce W. Wessels
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Materials Science and Engineering
Deborah A. Neumayer
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Chemistry
Tobin J. Marks
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Chemistry
Jon L. Schindler
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Electrical Engineering and Computer Science
Carl R. Kannewurf
Affiliation:
Science and Technology Center for Superconductivity, Northwestern University, Evanston, IL 60208-3113 Northwestern University, Department of Electrical Engineering and Computer Science
Get access

Abstract

Bi2Sr2CaCu2O8 thin films have been prepared in situ by low pressure metalorganic chemical vapor deposition using fluorinated β–diketonate precursors. The influence of the growth conditions on the oxide phase stability and impurity phase formation was examined as well as the superconducting properties of the films. Thin films deposited on LaAIO3 substrates were epitaxial as confirmed by x-ray diffraction measurements, including θ-2θ and φ scans. Four probe resistivity measurements showed the films to be superconducting with a maximum Tc0 of 90 K without post annealing. This Tc0 is among the highest reported for thin films of the BSCCO (2212) phase, and approaches reported bulk values.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 335: Symposium Y – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics , 1993 , 285
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Bozovic, I., Eckstein, J. N., Klausmeier-Brown, M. E., Virshup, G. F. and Ralls, K. S., Mat. Res. Soc. Symp. Proc. 275, 67 (1992).CrossRefGoogle Scholar
2. Wagner, P., Hillmer, F., Frey, U., Adrian, H., Steinborn, T., Ranno, L., Elschner, A., Heyvaert, I. and Bruynseraede, Y., Physica C 215, 123 (1993).Google Scholar
3. Balestrino, G., Marinelli, M., Milani, E., Montouri, M., Paoletti, A. and Paroli, P., J. Appl. Phys. 72, 191 (1992).Google Scholar
4. Endo, K., Yamasaki, H., Misawa, S., Yoshidaand, S. Kajimura, K., Physica C 1856, 1949 (1991).CrossRefGoogle Scholar
5. Sugimoto, T., Yoshida, M., Yamaguchi, K., Sugawara, K. and Tanaka, S., Appl. Phys. Lett. 57, 928 (1990).CrossRefGoogle Scholar
6. Natori, K., Yoshizawa, S., Yoshino, J. and Kukimoto, H., Jpn. J. Appl. Phys 28, L1578 (1989).Google Scholar
7. Schieber, M., J. Cryst. Growth 109,401 (1991).Google Scholar
8. Zhang, J. M., Wessels, B. W., Richeson, D. S., Marks, T. J., Degroot, D. C. and Kannewurf, C. R., J. Appl. Phys. 69, 2743 (1991).Google Scholar
9. Timmer, K., Spee, K. I. M. A., mackorand, A. Meinema, H. A., Inorganica Chimica Acta 190, 109 (1991).CrossRefGoogle Scholar
10. Schulz, D. L., Neumayer, D. A. and Marks, T. J., submitted to Inorg. SynthesisGoogle Scholar
11. Strobel, P., Korczak, W. and Fournier, T., Physica C 161, 167 (1989).Google Scholar
12. Harsta, A. and Carlsson, J. O., J. Cryst. Growth 114, 507 (1991).Google Scholar
13. Chen, J., Lu, H. A., DiMeo, F. Jr, Wessels, B. W., Schulz, D. L., Marks, T. J., Schindler, J. L. and Kannewurf, C. R., J. Appl. Phys. 73,4080 (1993).Google Scholar
14. Lyding, J. W., Marcy, H. O., Marks, T. J. and Kannewurf, C. R., IEEE Trans. Instrum. Meas. 37, 76 (1988).Google Scholar