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In Situ Biaxial Texture Analysis of Mgo Films During Growth on Amorphous Substrates by Ion Beam-Assisted Deposition

Published online by Cambridge University Press:  21 March 2011

Rhett T. Brewer
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA [email protected]
Paul N. Arendt
Affiliation:
Los Alamos National Laboratories, Los Alamos, NM
James R. Groves
Affiliation:
Los Alamos National Laboratories, Los Alamos, NM
Harry A. Atwater
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA
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Abstract

We used a previously reported kinematical electron scattering model1 to develop a RHEED based method for performing quantitative analysis of mosaic polycrystalline thin film in-plane and out-of-plain grain orientation distributions. RHEED based biaxial texture measurements are compared to X-Ray and transmission electron microscopy measurements to establish the validity of the RHEED analysis method. In situ RHEED analysis reveals that the out-of-plane orientation distribution starts out very broad, and then decreases during IBAD MgO growth. Other results included evidence that the in-plane orientation distribution narrows, the grain size increases, and the film roughens as film thickness increases during IBAD MgO growth. Homoepitaxy of MgO improves the biaxial texture of the IBAD layer, making X-ray measurements of IBAD films with an additional homoepitaxial layer not quantitatively representative of the IBAD layer. Systematic offsets between RHEED analysis and X-ray measurements of biaxial texture, coupled with evidence that biaxial texture improves with increasing film thickness, indicate that RHEED is a superior technique for probing surface biaxial texture.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Brewer, R.T., Hartman, J.W., and Atwater, H.A., Mat. Res. Soc. Symp. Proc. 585, 75 (2000).Google Scholar
2. Lin, W.J., Tseng, T.Y., Lu, H.B., Tu, S.L., Yang, S.J., and Lin, I.N., J. Appl. Phys., 77, 6466 (1995).Google Scholar
3. Wakiya, N., Kuroyanagi, K., Xuan, Y., Shinozaki, K., and Mizutani, N., Thin Solid Films, 357, 166 (1999).Google Scholar
4. McKee, R.A., Walker, F.J., and Chisholm, M.F., Phys. Rev. Lett., 81, 3014 (1998).Google Scholar
5. Wang, C.P., Do, K.B., Beasley, M.R., Geballe, T.H., and Hammond, R.H., Appl. Phys. Lett. 71, 2955 (1997).Google Scholar
6. Wang, C.P., Ph.D. Thesis, Stanford University, (1999).Google Scholar
7. Dong, L. and Srolovitz, D.J., J. Appl. Phys. 84, 5261 (1998).Google Scholar