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In situ and Ex situ Applications of Spectroscopic Ellipsometry

Published online by Cambridge University Press:  22 February 2011

John A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508 University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Blaine Johs
Affiliation:
University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
William A. McGahan
Affiliation:
University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Paul G. Snyder
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Jeffrey Hale
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Huade Walter Yao
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
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Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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