Hostname: page-component-586b7cd67f-dsjbd Total loading time: 0 Render date: 2024-11-20T09:28:31.349Z Has data issue: false hasContentIssue false

Improvement of Photoelectrochemical Reaction for Hydrogen Generation from Water using N-face GaN

Published online by Cambridge University Press:  31 January 2011

Katsushi Fujii
Affiliation:
[email protected], Tohoku University, Center for interdisciplinary research, Sendai, Miyagi, Japan
Keiichi Sato
Affiliation:
[email protected], Tohoku University, Center for interdisciplinary research, Sendai, Japan
Takashi Kato
Affiliation:
[email protected], Tohoku University, Center for interdisciplinary research, Sendai, Japan
Tsutomu Minegishi
Affiliation:
[email protected], Tohoku University, Center for interdisciplinary research, Sendai, Japan
Takafumi Yao
Affiliation:
[email protected], Tohoku University, Center for interdisciplinary research, Sendai, Japan
Get access

Abstract

Photoelectrochemical properties of Ga- and N-face GaN grown by hydride vapor phase epitaxy (HVPE) were investigated. The properties were also compared with Ga-face GaN grown by metal-organic vapor phase epitaxy (MOVPE). The flatband potentials were in order of Ga-face GaN grown by MOVPE < N-face GaN < Ga-face GaN. The highest photocurrent density at zero bias was obtained from the N-face GaN. The photocurrent density was over 3 times larger than that of Ga-face GaN.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1for example Nozik, A.J. and Memming, R., J. Phys. Chem. 100, 13061 (1996).10.1021/jp953720eGoogle Scholar
2 Grimes, C. A., Varghese, O. K. and Ranjan, S., Light, Water, Hydrogen, (Springer, New York, 2008), pp. 399-400, pp. 462464.10.1007/978-0-387-68238-9Google Scholar
3 Kocha, S. S., Peterson, M. W., Arent, D. J., Redwing, J. M., Tischler, M. A. and Turner, J. A., J. Electrochem. Soc., 142, L238 (1995).10.1149/1.2048511Google Scholar
4 Ono, M., Fujii, K., Ito, T., Iwaki, Y., Hirako, A., Yao, T. and Ohkawa, K., J. Chem. Phys., 126, 054708 (2007).10.1063/1.2432116Google Scholar
5 Fujii, K., Ono, M., Ito, T., Iwaki, Y., A. Hirako and K. Ohkawa, J. Electrochem. Soc., 154, B175 (2007).10.1149/1.2402104Google Scholar
6 Arai, N., Saito, N., Nishiyama, H., Inoue, Y., Domen, K. and Sato, K., Chem. Lett., 35, 796 (2006).10.1246/cl.2006.796Google Scholar
7 Fujii, K., Iwaki, Y., Masui, H., Baker, T. J., Iza, M., Sato, H., Kaeding, J., Yao, T., Speck, J. S., DenBaars, S. P., Nakamura, S. and Ohkawa, K., Jpn. J. Appl. Phys., 46, 6573 (2007).Google Scholar