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Imprint resist properties for bit patterned media (BPM)

Published online by Cambridge University Press:  10 August 2011

J. Lille ,
T. Karis ,
D. Vasquez  and
T-W. Wu
J. Lille
Affiliation:
Hitachi San Jose Research Center, San Jose, CA 95135, U.S.A.
T. Karis
Affiliation:
Hitachi San Jose Research Center, San Jose, CA 95135, U.S.A.
D. Vasquez
Affiliation:
Hitachi San Jose Research Center, San Jose, CA 95135, U.S.A.
T-W. Wu
Affiliation:
Hitachi San Jose Research Center, San Jose, CA 95135, U.S.A.
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Abstract

Nanoimprint lithography is a low cost method which produces trillions of nanostructures on a substrate. One application of this technology is patterned magnetic media where a single imprint on a disk can create a masking layer with more than a trillion nanostructures. Several challenges exist to imprinting bit patterned media (BPM) at a density greater than 1Tbit/in2. This technology would allow an extension of hard drive magnetic recording at densities greater than 1Tbit/in2. One such challenge is imprint resist mechanical properties where the imprinted masking layer should be free of thickness variations and resist flop-over. Herein we describe the nanoindentation mechanical properties of several imprint resist systems along with analysis of imprinted features of BPM at densities between 200-482 Gdots/in2.

Keywords

lithography (deposition)nano-indentationnanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1340: Symposium T – High-Speed and Large-Area Printing of Micro/Nanostructures and Devices , 2011 , mrss11-1340-t01-04
Copyright
Copyright © Materials Research Society 2011

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References

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