Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-23T11:50:24.515Z Has data issue: false hasContentIssue false
  • English
  • Français

Impact of EBAS annealing on sheet resistance reduction for Al-implanted 4H-SiC(0001)

Published online by Cambridge University Press:  01 February 2011

Masami Shibagaki ,
Akihiro Egami ,
Akira Kumagai ,
Kenji Numajiri ,
Fumio Watanabe ,
Shigetaka Haga ,
Kuniaki Miura ,
Shingo Miyagawa ,
Naohiro Kudoh  and
Tomoyuki Suzuki
...Show all authors
Masami Shibagaki
Affiliation:
[email protected], Canon ANELVA Corporation, Advanced Technology Dept, 5-8-1 Yotsuya, Fuchu, Tokyo, N/A, 183-8508, Japan, 81-42-334-0240, 81-42-334-0962
Akihiro Egami
Affiliation:
[email protected], Canon ANELVA Corporation, Advanced Technology Dept, 5-8-1 Yotsuya, Fuchu, Tokyo, N/A, 183-8508, Japan
Akira Kumagai
Affiliation:
[email protected], Canon ANELVA Corporation, Advanced Technology Dept, 5-8-1 Yotsuya, Fuchu, Tokyo, N/A, 183-8508, Japan
Kenji Numajiri
Affiliation:
[email protected], Canon ANELVA Corporation, Advanced Technology Dept, 5-8-1 Yotsuya, Fuchu, Tokyo, N/A, 183-8508, Japan
Fumio Watanabe
Affiliation:
[email protected], Sukegawa Electric, 3333 Kami-tezuna, Takahagi, Ibaraki, 318-0004, Japan
Shigetaka Haga
Affiliation:
[email protected], Sukegawa Electric, 3333 Kami-tezuna, Takahagi, Ibaraki, 318-0004, Japan
Kuniaki Miura
Affiliation:
[email protected], Sukegawa Electric, 3333 Kami-tezuna, Takahagi, Ibaraki, 318-0004, Japan
Shingo Miyagawa
Affiliation:
[email protected], Hosei University, Research Center of Ion Beam Technology, 3-7-2 Kajino-cho, Koganei, Tokyo, 184-8584, Japan
Naohiro Kudoh
Affiliation:
[email protected], Hosei University, Research Center of Ion Beam Technology, 3-7-2 Kajino-cho, Koganei, Tokyo, 184-8584, Japan
Tomoyuki Suzuki
Affiliation:
[email protected], Hosei University, Research Center of Ion Beam Technology, 3-7-2 Kajino-cho, Koganei, Tokyo, 184-8584, Japan
Masataka Satoh
Affiliation:
[email protected], Hosei University, Research Center of Ion Beam Technology, 3-7-2 Kajino-cho, Koganei, Tokyo, 184-8584, Japan
Get access

Abstract

In this paper, we demonstrate that high temperature and short time EBAS annealing is effective to obtain low sheet resistance without surface roughening in heavily Al-implanted 4H-SiC (0001) samples (Al concentration: 1.0 × 1021 /cm3, thickness: 0.3 microns, total dose: 2.6 × 1016 /cm2). The sheet resistance and rms surface roughness of the sample annealed at 1800 °C for 0.5 min is estimated to be 4.8k ohm/sq. and 0.82 nm, respectively. Also, we discuss the advantage of EBAS annealing for the suppression of surface roughening during annealing.

Keywords

annealingelectrical propertiesmorphology
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 911: Symposium B – Silicon Carbide 2006 – Materials, Processing and Devices , 2006 , 0911-B11-02
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Capano, M. A., Ryu, S., Melloch, M. R., Cooper, J. A. Jr, and Buss, M. R.: J. Electron. Mater. 27, 370 (1998)Google Scholar
2 Shibagaki, M., Kurematsu, Y., Watanabe, F., Haga, S., Miura, K., Suzuki, T. and Satoh, M.: Mater. Sci Forum Vol 483–485, 609 (2005)Google Scholar
3 Shibagaki, M., Satoh, M., Numajiri, K., Kurematsu, Y., Watanabe, F., Haga, S., Miura, K., Miyagawa, S. and Suzuki, T.: Proceedings of ICSCRM2005, Pittsburgh, Mat. Sci Forum (2006) in pressGoogle Scholar
4 Senzaki, J., Fukuda, K. and Arai, K.: J.Appl. Phys. 919, 2942 (2003)Google Scholar