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Highly Oriented Co Soft Magnetic Films on Si Substrates

Published online by Cambridge University Press:  10 February 2011

Heng Gong ,
Wei Yang ,
Maithri Rao ,
David E. Laughlin  and
David N. Lambeth
Heng Gong
Affiliation:
Department of Electrical and Computer Engineering, [email protected]
Wei Yang
Affiliation:
Department of Electrical and Computer Engineering, [email protected]
Maithri Rao
Affiliation:
Department of Materials Science and Engineering, Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA 15213-3890
David E. Laughlin
Affiliation:
Department of Materials Science and Engineering, Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA 15213-3890
David N. Lambeth
Affiliation:
Department of Electrical and Computer Engineering, [email protected]
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Abstract

Thin Co and Co based alloy films with the face centered cubic (FCC) structure have been epitaxially grown on single crystal Si wafers by sputter deposition. Epitaxial orientation relationships have been determined by x-ray diffraction, x-ray pole figure scans and TEM. Magnetic properties have been characterized using vibrating sampling magnetometer (VSM), torque magnetometer and BH loop tracer. Soft magnetic properties have been observed for the pure Co films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 562: Symposium L – Polycrystalline Metal & Magnetic Thin Films , 1999 , 27
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

«1» Lambeth, D. N. et al., Mat. Rec. Soc. Symp. Proc., VoL 517, 181(1998).Google Scholar
«2» Gong, H., Rao, M., Laughlin, D. E., and Lambeth, D. N., J. AppL Phys. 85, 5750(1999).Google Scholar
«3» Gong, H., Rao, M., Laughlin, D. E., and Lambeth, D. N., J. AppL Phys. 85, 4699(1999).Google Scholar
«4» Yang, W., Lambeth, D. N., Tang, L., and Laughlin, D. E., J. AppL Phys. 81, 4370(1997).Google Scholar
«5» Yang, W., Lambeth, D. N., and Laughlin, D. E., J. Appl. Phys. 85, 4723(1999).Google Scholar
«6» For example, see Cullity, B. D. ‘Introduction to Magnetic Materials’ Page 221, Addison-Wesley Publishing Company, Inc. (1972).Google Scholar