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High throughput characterization of magnetic semiconductor thin films with a scanning SQUID microscope

Published online by Cambridge University Press:  17 March 2011

X. J. Fan ,
M. Murakami ,
R. Takahasi ,
T. Koida ,
Y. Matsumoto ,
T. Hasegawa ,
T. Fukumura ,
M. Kawasaki ,
P. Ahmet  and
T. Chikyow
...Show all authors
X. J. Fan
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
M. Murakami
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
R. Takahasi
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
T. Koida
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan
Y. Matsumoto
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
T. Hasegawa
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
T. Fukumura
Affiliation:
Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
M. Kawasaki
Affiliation:
Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
P. Ahmet
Affiliation:
Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
T. Chikyow
Affiliation:
Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
H. Koinuma
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan
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Abstract

Magnetic properties of Co-doped rutile (Ti1-xCoxO2) film in combinatorial composition-spread form have been surveyed by means of a Scanning Superconducting-quantum-interference-device Microscope (SSM). As a consequence, we found magnetic domains in the spatial regions with x>0.05 without external field, giving strong evidence for ferromagnetism with finite spontaneous magnetization. The magnetic moment was monotonously increased with increasing doping level x from 0.05 to ∼ 0.13. On the other hand, it was almost unchanged for x > ∼ 0.13, suggesting that Co does not dissolve into rutile film beyond x ∼ 0.13. The SSM results on the rutile Ti0.95Co0.05O2 thin films with different thickness showed that the magnetic moment is proportional to film thickness, leading to a conclusion that the presently observed ferromagnetism does not result from Co or Co-based oxide particles on the film surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 700: Symposium S – Combinatorial and Artificial Intelligence Methods in Materials Science , 2001 , S2.7
Copyright
Copyright © Materials Research Society 2002

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References

1. Matsumoto, Yuji, Murakami, Makoto, Shono, Tomoji, Hasegawa, Tetsuya, Fukumura, Tomoteru, Kawasaki, Maseshi, Ahmet, Parhat, Chikyow, Toyohiro, Koshihara, Shin-ya, Koinuma, Hideomi, Science, 291, 854 (2001).Google Scholar
2. Matsumoto, Y., Fan, Xiao-Juan and Hasegawa, T., Takahashi, R., Koida, T., Murakami, M., Koinuma, H., Fukumura, T., Kawasaki, M., and Koshihara, S., Jpn. J. Appl. Phys., 40, L1204 (2001).Google Scholar
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