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High Temperature Photoluminescence and Photoluminescence Excitation Spectroscopy of Er Doped Gallium Nitride
Published online by Cambridge University Press: 10 February 2011
Abstract
We report results of high temperature photoluminescence and photoluminescence excitation studies of Er doped GaN. Er was doped into GaN either by ion-implantation or during growth by metalorganic molecular beam epitaxy (MOMBE). Using above gap excitation (λex=325nm), GaN:Er showed strong 1.54 μm Er3+ luminescence up to 550K which indicates the potential of this material for high temperature opto-electronic applications. In addition, we performed timeresolved photoluminescence excitation (PLE) measurements over the wavelength range 420 to 680 nm using a Nd:YAG pumped Optical Parametric Oscillator (OPO). Similar to our previous PLE results of Er doped AIN, we observed that Er3+ ions in GaN can be excited either through resonant pumping of Er3+ energy levels or through energy-transfer processes involving defect states. The relative contribution of direct and indirect Er3+ excitation, however, seems to depend on the material preparation method.
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- Copyright © Materials Research Society 1998
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