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High Resolution Electron Microscopy Studies of Interfaces Between Al203 Substrates and MBE Grown NB Films

Published online by Cambridge University Press:  26 February 2011

J. Mayer ,
J. Dura ,
C.P. Flynn  and
M. RüHle
J. Mayer
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, 7000 Stuttgart, FRG
J. Dura
Affiliation:
University of Illinois at Urbana-Champaign, Materials Research Laboratory, Urbana, IL 61801, USA
C.P. Flynn
Affiliation:
University of Illinois at Urbana-Champaign, Materials Research Laboratory, Urbana, IL 61801, USA
M. RüHle
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, 7000 Stuttgart, FRG
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Abstract

Single crystal niobium films were grown by Molecular Beam Epitaxy (MBE) on (0001)s sapphire substrates. Cross-sectional specimens with thickness of <20 nm were prepared so that the Nb/A1203 interface could be investigated by high resolutionelectron microscopy (HREM). The orientation relationship between the metal film and the ceramic substrate was verified by selected area diffraction: (111)Nb ║(0001)S and [110]Nb║[2110]S. The atomistic structure of the interface was identified by HREM.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 209: Symposium K – Defects in Materials , 1990 , 673
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

[1] Rdihle, M., Evans, A.G., Ashby, M.F., and Hirth, J.P. (eds.), Structure Chemistry and Fracture Resistance of Metal/Ceramic Interfaces,(Pergamon Press, 1990).Google Scholar
[2] Fischmeister, H., Mader, W., Gibbesch, B., and Elssner, G., Mater. Res. Symp.Proc. 22 529 (1988).Google Scholar
[3] Mader, W., Z. Metallkunde 80, 139 (1989).Google Scholar
[4] Mayer, J., Flynn, C.P., and Riihle, M., Ultramicroscopy 33, 51 (1990).Google Scholar
[5] Knaulβ, D. and Mader, W., Ultramicroscopy, submitted.Google Scholar
[6] Mayer, J., Mader, W., Phillipp, F.O., Flynn, C.P., and Riihle, M., Inst. Phys. Conf.Ser. 98 (EMAG 89), 349 (1989).Google Scholar
[7] Stadelmann, P.H., Ultramicroscopy 21, 131 (1987).Google Scholar
[8] Spence, J.C.H., Experimental High Resolution Electron Microscopy, 2nd ed.(Claredon Press, Oxford, 1987).Google Scholar
[9] French, T.M. and Somorjai, G.A., J. Phys. Chem. 74, 2409 (1970).Google Scholar
[10] Mayer, J., to be published.Google Scholar