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High Resolution Electron Beam Lithographic Deposition of Metal and Metal Oxide Films from Metal Complexes

Published online by Cambridge University Press:  17 March 2011

Xin Zhang  and
Ross H. Hill
Xin Zhang
Affiliation:
Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
Ross H. Hill
Affiliation:
Department of Chemistry, Simon Fraser University, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
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Abstract

In this paper, a method of direct electron beam lithographic deposition of metal and metal oxide films is demonstrated using metal organic complexes. In this method, a solution of a metal complex is used to spin coat a substrate to obtain a precursor film. The precursor film is then directly patterned by electron beam writing. A solvent is then used to develop the latent image. Using examples of titanium, tantalum, zirconium, and gold, we illustrate patterning of metal and metal oxide films and both positive and negative deposition. The feature size demonstrated is as low as 14 nm while the demonstrated aspect ratio is as high as 11.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1002: Symposium N – Printing Methods for Electronics, Photonics and Biomaterials , 2007 , 1002-N05-07
Copyright
Copyright © Materials Research Society 2007

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References

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