Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-17T17:27:27.543Z Has data issue: false hasContentIssue false

High Quality Microcrystalline Silicon-Carbide Films Prepared by Photo-CVD Method Using Ethylene Gas as a Carbon Source

Published online by Cambridge University Press:  15 February 2011

Seung Yeop Myong
Affiliation:
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology373-1 Kusong-dong, Yusong-gu, Taejon 305-701, Korea Tel: +82-42-869-8046, 8027/ FAX: +82-42-869-8530/ E-mail:, [email protected]
Hyung Kew Lee
Affiliation:
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology373-1 Kusong-dong, Yusong-gu, Taejon 305-701, Korea Tel: +82-42-869-8046, 8027/ FAX: +82-42-869-8530/ E-mail:, [email protected]
Euisik Yoon
Affiliation:
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology373-1 Kusong-dong, Yusong-gu, Taejon 305-701, Korea Tel: +82-42-869-8046, 8027/ FAX: +82-42-869-8530/ E-mail:, [email protected]
Koeng Su Lim
Affiliation:
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology373-1 Kusong-dong, Yusong-gu, Taejon 305-701, Korea Tel: +82-42-869-8046, 8027/ FAX: +82-42-869-8530/ E-mail:, [email protected]
Get access

Abstract

Hydrogenated boron-doped microcrystalline silicon-carbide (p-μc-SiC:H) films were grown by a photo chemical vapor deposition (photo-CVD) method from silane (SiH4), hydrogen (H2), diborane (B2H6), and ethylene (C2H4) gases. Since the photo-CVD is a mild process (~10mW/cm2), we can avoid the ion damage of the film, which is inevitable during the deposition of μc-SiC:H employing conventional PECVD technique. A dark conductivity as high as 5 × 10-1 S/cm, together with an optical bandgap of 2 eV, was obtained by the C2H4 addition, which is the first approach in photo-CVD systems. From the Raman and FTIR spectra, it is clear that our p-μc-SiC:H films are made up of crystalline silicon grains embedded in amorphous silicon-carbide tissue. We investigate the role of the hydrogen dilution and ethylene addition on the electrical, optical, and structural properties of p-μc-SiC:H films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Jang, J. H. and Lim, K. S., Jpn. J. Appl. Phys. 36, L1082 (1997); 36, 6230 (1997); Appl.Phys. Lett. 71, 1846 (1997).Google Scholar
2. Lee, J. W. and Lim, K. S., Appl. Phys. Lett. 68, 1031 (1996); 69, 547 (1996); J. Appl. Phys. 81(5), 2432 (1997).Google Scholar
3. Tawada, Y., Tsuge, K., Kondo, M., Okamoto, H., and Hamakawa, Y., J. Appl. Phys. 53, 5273 (1982).Google Scholar
4. Goldstein, B. and Dickson, C. R., Appl. Phys. Lett. 53, 2672 (1988).Google Scholar
5. Demichelis, F., Pirri, C. F. and Tresso, E., Phil. Mag. B 67, 331 (1993).Google Scholar
6. Fluckiger, R., Meier, J., Shah, A., Pohl, J., Tzolov, M. and Carius, R., Mater. Res. Soc. Symp. Proc. 358, 793 (1995).Google Scholar
7. Hamakawa, Y., Matsumoto, Y., Hirata, G. and Okamoto, H., Mater. Res. Soc. Symp. Proc. 164, 291 (1990).Google Scholar
8. Dasgupta, A., Ghosh, S. and Ray, S., J. Mater. Sci. Lett. 14, 1037 (1995).Google Scholar
9. Cho, W. Y. and Lim, K. S., Jpn. J. Appl. Phys. 36, 1094 (1997).Google Scholar
10. Campbell, I. H. and Fauchet, P. M., Solid State Commun. 58, 739 (1986); CRC Crit. Rev. Solid State Mater. Sci. 14, S79 (1988).Google Scholar
11. Ghosh, S., De, A., Ray, S. and Bama, A. K., J. Appl. Phys. 71, 5205 (1992)Google Scholar
12. Matsuda, A., J. Non-Cryst. Solids 59&60, 767 (1983)Google Scholar
13. Ambrosone, G., Catalanotti, S., Coscia, U., Mormone, S., Cutolo, A., and Breglio, G., presented at the 2nd World Conf. and Exhib. on PVSEC, Vienna, Austria, 1998 (unpublished).Google Scholar