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High Mobility Nanocrystalline Indium Zinc Oxide Deposited at Room Temperature

Published online by Cambridge University Press:  17 March 2011

E. Fortunato
Affiliation:
Materials Science Department/CENIMAT, Faculty of Sciences and Technology of New University of Lisbon and CEMOP/UNINOVA, Campus da Caparica, 2829-516 Caparica, Portugal
A. Pimentel
Affiliation:
Materials Science Department/CENIMAT, Faculty of Sciences and Technology of New University of Lisbon and CEMOP/UNINOVA, Campus da Caparica, 2829-516 Caparica, Portugal
A. Gonçalves
Affiliation:
Materials Science Department/CENIMAT, Faculty of Sciences and Technology of New University of Lisbon and CEMOP/UNINOVA, Campus da Caparica, 2829-516 Caparica, Portugal
A. Marques
Affiliation:
Materials Science Department/CENIMAT, Faculty of Sciences and Technology of New University of Lisbon and CEMOP/UNINOVA, Campus da Caparica, 2829-516 Caparica, Portugal
R. Martins
Affiliation:
Materials Science Department/CENIMAT, Faculty of Sciences and Technology of New University of Lisbon and CEMOP/UNINOVA, Campus da Caparica, 2829-516 Caparica, Portugal
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Abstract

In this paper we present results of indium doped zinc oxide deposited at room temperature by rf magnetron sputtering, with electron mobility as high as 60 cm2/Vs. The films present a resistivity as low as 5 × 10-4 ωcm with an optical transmittance of 85%. The structure of these films look-like polymorphous (mixed of different amorphous and nanocrystalline phases from different origins) as detected from XRD patterns (no clear peak exists) with a high smooth surface, as detected from SEM micrographs, highly important to ensure long life time when used in display devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

1. Hartnagel, H.L., Dawar, A.L., Jain, A.K., Jagadish, C., Semiconducting Transparent Thin Films, Institute of Physics Publ., Bristol 1995.Google Scholar
2. Minami, T., Kakumu, T., Takeda, Y., Takata, S., Thin Solid Films 290–291, 1 (1996).Google Scholar
3. Naghavi, N., Rougier, A., Marcel, C., Guéry, C., Leriche, J.B., Tarascon, J.M., Thin Solid Films 360, 233 (2000).Google Scholar
4. Naghavi, N., Marcel, C., Dupont, L., Rougier, A., Leriche, J.B., Guéry, C., J. Mater. Chem. 10, 2315 (2000).Google Scholar
5. Naghavi, N., Marcel, C., Dupont, L., Guéry, C., Maugy, C., Tarascon, J.M., Thin Solid Films 419, 160 (2002).Google Scholar
6. Sasabayashi, T., Ito, N., Nishimura, E., Kon, M., Song, P.K., Utsumi, K., Kaijo, A., Shigesato, Y., Thin Solid Films 445, 219 (2003).Google Scholar
7. Jung, Y. S., Seo, J.Y., Lee, D.W., Jeon, D.Y., Thin Solid Films 445, 63 (2003).Google Scholar
8. Ellmer, K., J. Phys. D: Appl. Phys. 33, R17 (2000).Google Scholar
9. Waits, R.K., Thin Film Processes, Ed. Vossen, J.L., Kern, W., Academic Press, S. Diego, 1978, Part IV.Google Scholar