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High Integrity SiO2/Al2O3 Gate Stack for Normally-off GaN MOSFET

Published online by Cambridge University Press:  27 June 2013

Hiroshi Kambayashi ,
Takehiko Nomura ,
Hirokazu Ueda ,
Katsushige Harada ,
Yuichiro Morozumi ,
Kazuhide Hasebe ,
Akinobu Teramoto ,
Shigetoshi Sugawa  and
Tadahiro Ohmi
Hiroshi Kambayashi
Affiliation:
Advanced Power Device Research Association, Yokohama 220-0073, Japan New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
Takehiko Nomura
Affiliation:
Advanced Power Device Research Association, Yokohama 220-0073, Japan
Hirokazu Ueda
Affiliation:
Tokyo Electron Technology Development Institute Inc., Sendai 981-3137, Japan
Katsushige Harada
Affiliation:
Tokyo Electron Tohoku Ltd., Nirasaki, Yamanashi 407-0192, Japan
Yuichiro Morozumi
Affiliation:
Tokyo Electron Ltd., Minato-ku, Tokyo 107-6325, Japan
Kazuhide Hasebe
Affiliation:
Tokyo Electron Tohoku Ltd., Nirasaki, Yamanashi 407-0192, Japan
Akinobu Teramoto
Affiliation:
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
Shigetoshi Sugawa
Affiliation:
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
Tadahiro Ohmi
Affiliation:
New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
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Abstract

High integrity SiO2/Al2O3 gate stack has been demonstrated for GaN metal-oxide-semiconductor (MOS) transistors. The SiO2 film formed on GaN by the microwave-excited plasma enhanced chemical vapor deposition (MW-PECVD) exhibits good properties compared that by the LP (Low Pressure)-CVD. Then, by incorporating the advantages of both of SiO2 with a high insulating and Al2O3 with good interface characteristics, the SiO2/Al2O3 gate stack structure has been employed in GaN MOS devices. The structure shows a low interface state density between gate insulator and GaN, a high breakdown field, and a large charge-to-breakdown by applying 3-nm Al2O3. The SiO2/Al2O3 gate stack has also been applied to AlGaN/GaN hybrid MOS heterojunction field-effect transistor (HFET) and the HFET shows excellent properties with the threshold voltage of 4.2 V and the maximum field-effect mobility of 192 cm2/Vs.

Keywords

III-Vnitrideelectrical properties
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1561: Symposium CC – Gate Stack Technology for End-of-Roadmap Devices in Logic, Power and Memory , 2013 , mrss13-1561-cc02-08
Copyright
Copyright © Materials Research Society 2013 

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References

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