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High Energy Focused Ion Beam Nanoprobes: Design and Applications

Published online by Cambridge University Press:  26 February 2011

Gary A. Glass ,
Bibhudutta Rout ,
Alexander D. Dymnikov ,
Elia V. Eschenazi ,
Richard Greco  and
Daniel P. Zachry
Gary A. Glass
Affiliation:
[email protected], Louisiana Accelerator Center, United States
Bibhudutta Rout
Affiliation:
[email protected], Louisiana Accelerator Center, United States
Alexander D. Dymnikov
Affiliation:
[email protected], Louisiana Accelerator Center, United States
Elia V. Eschenazi
Affiliation:
[email protected], Xavier University of Louisiana, Physics and Dual Degree Engineering, United States
Richard Greco
Affiliation:
[email protected], Los Alamos National Laboratory
Daniel P. Zachry
Affiliation:
[email protected], Louisiana Accelerator Center, United States
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Abstract

An overview of the present state of high energy focused ion beam (HEFIB) system technology, nanoprobe system design and specific ion beam writing applications will be presented. In particular, the combination of P-beam, heavy-ion writing and ion implantation to produce microstructures in resists and silicon will be demonstrated.

Heretofore, the development of HEFIB technology worldwide has progressed through a series of developments at independent research facilities, each having relatively narrow and mostly isolated, research purposes. However, a complete, versatile HEFIB nanoprobe system capable of both analysis and modification will require the combination of several component systems, each with specialized technology, and significant advances in the design of a complete system can only be expected from an effort that includes a coordinated development of the component parts.

Keywords

ion-beam processingmicrostructurelithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 908: Symposium OO – Growth, Modification, and Analysis by Ion Beams at the Nanoscale , 2005 , 0908-OO06-01
Copyright
Copyright © Materials Research Society 2006

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