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HgCdTe(211)B Grown on CdTe(211)B/ZnTe(211)B/Si(211) by MBE

Published online by Cambridge University Press:  10 February 2011

S. Rujirawat
Affiliation:
Microphysics Laboratory, Dept. Of Physics (M/C 273), The University of Illinois at Chicago, 845, W. Taylor Street, Room #2236, Chicago, IL 60680; [email protected]
P. S. Wijewarnasuriya
Affiliation:
Microphysics Laboratory, Dept. Of Physics (M/C 273), The University of Illinois at Chicago, 845, W. Taylor Street, Room #2236, Chicago, IL 60680; [email protected]
Y. P. Chen
Affiliation:
Microphysics Laboratory, Dept. Of Physics (M/C 273), The University of Illinois at Chicago, 845, W. Taylor Street, Room #2236, Chicago, IL 60680; [email protected]
F. Aqariden
Affiliation:
Microphysics Laboratory, Dept. Of Physics (M/C 273), The University of Illinois at Chicago, 845, W. Taylor Street, Room #2236, Chicago, IL 60680; [email protected]
S. Sivananthan
Affiliation:
Microphysics Laboratory, Dept. Of Physics (M/C 273), The University of Illinois at Chicago, 845, W. Taylor Street, Room #2236, Chicago, IL 60680; [email protected]
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Abstract

We present preliminary results on HgCdTe(211)B layers grown on CdTe(211)B/ZnTe(211)B/Si substrates by molecular beam epitaxy. As-grown layers show excellent n-type characteristics as measured by Hall effect. Hall mibilities higher than 1×10 cm2/v-s have been measured at 40K for Cd composition ∼24% with doping level ∼ 3×1015 cm−3. Obtained RHEED patterns during the growth shows very smooth surface morphology.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Faune, J.P. and Million, A., J. Crystal Growth 54, 582 (1981)Google Scholar
2. Arias, J.M., Shin, S.H., Pasko, J.G., DeWames, R.E., and Gertner, E.R., J. Appl. Phys. 65, 1747 (1989)Google Scholar
3. Wijewarnasuriya, P.S., Lange, M.D., Sivananthan, S., and Faune, J.P., J. Elee. Materials, 24, 1211 (1995)Google Scholar
4. Sporken, R., Sivananthan, S., Mahavadi, K.K., Monfroy, G., Boukerche, M. and Faurie, J.P., Appl. Phys. Lett. 55, 1879 (1989)Google Scholar
5. Sporken, R., Lange, M.D., Sivananthan, S., and Faurie, J.P., Appl. Phys. Lett. 59, 81 (1991)Google Scholar
6. Kern, W., and Puotine, D.A., RCA Review, 31, pp. 187206 (1970)Google Scholar
7. Chen, Y.P., Sivananthan, S., and Faurie, J. P., J. Electron. Mater., 22, p. 951 (1991)Google Scholar
8. Almeida, L.A., Ph.D. Thesis University of Illinois 1996.Google Scholar