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Hardness-Damage Correlations in Ta Implanted Single Crystal Ni3Al

Published online by Cambridge University Press:  25 February 2011

Gary S. Was ,
Siegfried Mantl  and
Warren Oliver
Gary S. Was
Affiliation:
Institut für Schicht-und Ionentechnik, Kernforschungsanlage Jülich GmbH, D-5170, Jülich, Federal Republic of Germany., Permanent address: Department of Nuclear Engineering, University of Michigan, Ann Arbor, MI 48109 USA
Siegfried Mantl
Affiliation:
Institut für Schicht-und Ionentechnik, Kernforschungsanlage Jülich GmbH, D-5170, Jülich, Federal Republic of Germany.
Warren Oliver
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, TN 37831 USA
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Abstract

Implantation of Ta into single crystal Ni3Al was conducted to determine whether this would be an effective means of producing surface hardening in monolithic alloys. Ta was implanted at 400 keV to doses of 0.7, 3.6 and 25.2 × 1015 cm2 along the <100> axis of a <100> crystal of Ni3A1 at room temperature. Composition vs depth profiles were determined by RBS and lattice location of Ta was determined by channeling angular yield scans about the <100> axis. The hardness of the surface was measured by ultra-low load indentation. Results show that implantation softens the surface and that the Ta is randomly distributed between Ni and A1 sites. Annealing at 1000°C/1h significantly reduces the damage and causes preferential occupation of A1 sites by Ta. It also results in a slight increase in surface hardness. Further annealing at 1200°C/0.25 h increases the surface hardness substantially. The results indicate that the as-implanted surface is softened by disordering and subsequent diffusion of Ta to A1 sites causes hardening of the surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 771
Copyright
Copyright © Materials Research Society 1990

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