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Published online by Cambridge University Press: 10 February 2011
We have investigated the molecular beam epitaxy (MBE) growth of buried InAs quantum dots on GaAs (001) surface, as a function of deposition temperature, by transmission electron microscopy (TEM) and photoluminescence (PL). We found that the dot growth at low temperature is controlled by diffusion-limited aggregation. As the growth temperature increases, this growth mode is modified by misfit strain, resulting in a narrowing of the size distribution. However, we did not find any evidence for a thermodynamically optimized size. In addition, we found that the optical properties of the quantum dots does not correlate directly with the geometric size of the quantum dots, indicating a complex internal structure for quantum dots grown at high growth temperature.
Present address: Department of Chemical and Materials Engineering, University of Kentucky, 177 Anderson Hall, Lexington KY, 40506-00046, U.S.A.