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Growth of Ruthenium and Ruthenium oxide nanoplates

Published online by Cambridge University Press:  22 March 2011

Lamartine Meda  and
Geoffrey D. Stevens
Lamartine Meda
Affiliation:
Department of Chemistry, Xavier University of Louisiana, 1 Drexel Drive, New Orleans, LA 70125
Geoffrey D. Stevens
Affiliation:
Department of Chemistry, Xavier University of Louisiana, 1 Drexel Drive, New Orleans, LA 70125
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Abstract

By carefully manipulating and controlling the growth conditions, Ruthenium (Ru) and ruthenium oxide (RuO2) two-dimensional (2-D) nanostructure were self-assembled into a stack of plates on indium tin oxide coated glass substrate. The nanoplates were grown in a horizontal hot-wall metalorganic chemical vapor deposition (MOCVD) from ruthenocene. Each nanoplate has a thickness in the range of 25 - 60 nm and the average area is 1000 x 300 nm2. Each stack of nanoplates is approximately 1.2 m in height. A continuous layer of Ru and RuO2 thin film, which may serve as the growth template, is observed on the bottom of the nanoplate stacks. Field-emission scanning electron microscopy reveals that each stack of nanoplates was grown vertically aligned on the substrate and exhibited elongated shape. Structural properties which were examined by X-ray diffraction show that the nanoplates are polycrystalline.

Keywords

thin filmRuchemical vapor deposition (CVD) (deposition)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1309: Symposium EE – Solid-State Chemistry of Inorganic Materials VIII , 2011 , mrsf10-1309-ee03-14
Copyright
Copyright © Materials Research Society 2011

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