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The Growth of InAsSb/InGaAs Strained-Layer Superlattices by Metal-Organic Chemical Vapor Deposition

Published online by Cambridge University Press:  22 February 2011

R. M. Biefeld
Affiliation:
Sandia National Laboratory, Albuquerque, NM
K. C. Baucom
Affiliation:
Sandia National Laboratory, Albuquerque, NM
S. R. Kurtz
Affiliation:
Sandia National Laboratory, Albuquerque, NM
D. M. Follstaedt
Affiliation:
Sandia National Laboratory, Albuquerque, NM
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Abstract

We have grown InAsl-xSbx/Inl-yGayAs strained-layer superlattice (SLS) semiconductors lattice matched to InAs using a variety of conditions by metal-organic chemical vapor deposition. The V/III ratio was varied from 2.5 to 10 at a temperature of 475 °C, at pressures of 200 to 660 torr and growth rates of 3 - 5 A/s and layer thicknesses ranging from 55 to 152 Å. The composition of the InAsSb ternary can be predicted from the input gas molar flow rates using a thermodynamic model. At lower temperatures, the thermodynamic model must be modified to take account of the incomplete decomposition of arsine and trimethylantimony. Diodes have been prepared using Zn as the p-type dopant and undoped SLS as the n-type material. The diode was found to emit at 3.56 μm. These layers have been characterized by optical microscopy, SIMS, x-ray diffraction, and transmission electron diffraction. The optical properties of these SLS's were determined by infrared photoluminescence and absorption measurements.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

[1] Menna, R. J., Capewell, D. R., Martinelli, R. U., York, P. K., and Enstrom, R. E., Appl. Phys. Lett. 52, (1991) 2127.CrossRefGoogle Scholar
[2] Biefeld, R. M., J. Crystal Growth 27 (1986) 255.CrossRefGoogle Scholar
[3] Biefeld, R. M., Kurtz, S. R., and Casalnuovo, S. A., J. Crystal Growth 124 (1992) 401.CrossRefGoogle Scholar
[4] Biefeld, R. M., Hills, C. R. and Lee, S. R., J. Crystal Growth 21 (1988) 515.CrossRefGoogle Scholar
[5] Kurtz, S. R. and Biefeld, R. M., Phys. Rev. B 44, 1143 (1991).CrossRefGoogle Scholar
[6] Biefeld, R. M., J. Crystal Growth 75 (1986) 255.CrossRefGoogle Scholar
[7] Larsen, C. A., Li, S. H., Buchan, N. I., and Stringfellow, G. B., J. Crystal Growth, 102 (1990) 126.CrossRefGoogle Scholar
[8] Fang, Z. M., Ma, K. Y., Jaw, D. H., Cohen, R. M., and Stringfellow, G. B., J. Appl. Phys. 67, 7034 (1990).CrossRefGoogle Scholar
[9] Kurtz, S. R., Dawson, L. R., Biefeld, R. M., Follstaedt, D. M., and Doyle, B. L., Phys. Rev. B 46, 1909 (1992).CrossRefGoogle Scholar
[10] Wei, Su-Huai and Zunger, Alex, Appl. Phys. Lett. 5, 2684 (1991).CrossRefGoogle Scholar
[11] Esina, N. P., Zotova, N. V., Matveev, B. A., Stus, N. M.', Talalakin, G. N., and Abishev, T. D., Soy. Tech. Phys. Lett. 2, 167 (1983).Google Scholar
[12] Krier, A., Appl. Phys. Lett. 56, 2428 (1990).CrossRefGoogle Scholar